Breaking News
News & Analysis

Darkhorse litho technologies stay in NGL race

2/15/2012 08:30 AM EST
15 comments
NO RATINGS
Page 1 / 2 Next >
More Related Links
View Comments: Newest First | Oldest First | Threaded View
Page 1 / 2   >   >>
Jason_Liu
User Rank
Rookie
re: Darkhorse litho technologies stay in NGL race
Jason_Liu   2/19/2012 7:14:17 AM
NO RATINGS
Perhaps, regarding as the viewpoint of mass-production, the approach to improve the common DOF of the different characteristics of pattern,ex. iso- vs. dense- ,or line vs. space, is more practical and economic than that to put all resource to enhance the resolution.

Diogenes53
User Rank
Rookie
re: Darkhorse litho technologies stay in NGL race
Diogenes53   2/19/2012 5:16:20 AM
NO RATINGS
The dream of e-beam direct write has been around as long as x-ray lithography, and just as successful. The e-beam problems of throughput, data management and error correction simply cannot be solved in time, or economically. EUV, or, more correctly, soft x-ray projection lithography, continues to suffer from very x-ray like problems of decades ago. The only technology with the potential to complement optical lithography is imprint, which essentially is optical lithography: it uses an I-line source, I-line resists, and quartz based photomasks. Defects are a more manageable challenge than those facing EBDW and SXPL (EUV), particularly in memory. Lithography will bifurcate into solutions for logic and solutions for memory.

Diogenes53
User Rank
Rookie
re: Darkhorse litho technologies stay in NGL race
Diogenes53   2/19/2012 5:07:26 AM
NO RATINGS
H

rick merritt
User Rank
Blogger
re: Darkhorse litho technologies stay in NGL race
rick merritt   2/18/2012 2:13:45 AM
NO RATINGS
I wonder if the co-existance of several litho techs will make the economics tougher (lower volumes for all).

resistion
User Rank
Manager
re: Darkhorse litho technologies stay in NGL race
resistion   2/18/2012 12:54:17 AM
NO RATINGS
E-beam is more mature than optical for sure. But electrons, primary, photo-, or secondary, are prone to random disturbance. And they go into the substrate. So the interest in DSA, though it seems sensitive to the guiding pattern size.

ebmfuser
User Rank
Rookie
re: Darkhorse litho technologies stay in NGL race
ebmfuser   2/17/2012 11:06:42 PM
NO RATINGS
AND, the cost savings in masks alone would be enormous!!!

ebmfuser
User Rank
Rookie
re: Darkhorse litho technologies stay in NGL race
ebmfuser   2/17/2012 11:04:02 PM
NO RATINGS
Truly a shame that more 'professionals' don't look more seriously at e-beam lithography themselves, and not take the word of people in the photomask industry, who would directly be threatened if mask-less lithography came into popularity. E-beam litho has demonstrated nano-level capability for more than 20 years, with comparative overlay capability equaling the best aligners out there. Yes, throughput is an issue, but at 1/6 (or less) the cost of an good immersion stepper, you can buy several!!! Truth is that even the finest nano-imprint tool or EUV stepper will require masks, and they will only be available via e-beam lithography (as well as being ridiculously expensive and short lived). Direct write is a viable technology - today!

resistion
User Rank
Manager
re: Darkhorse litho technologies stay in NGL race
resistion   2/17/2012 9:18:37 AM
NO RATINGS
The critical layer tools need to be double or higher throughput, along with the track.

resistion
User Rank
Manager
re: Darkhorse litho technologies stay in NGL race
resistion   2/17/2012 6:33:17 AM
NO RATINGS
I think we can only count 10 nm and 7 nm, then what..and that would not be single patterning anymore either. CD variations on the order of lattice constants.

resistion
User Rank
Manager
re: Darkhorse litho technologies stay in NGL race
resistion   2/17/2012 6:19:31 AM
NO RATINGS
EUV doesn't have so many nodes left. Unless you mean to include the next wavelength.

Page 1 / 2   >   >>
Flash Poll
Radio
LATEST ARCHIVED BROADCAST
Join our online Radio Show on Friday 11th July starting at 2:00pm Eastern, when EETimes editor of all things fun and interesting, Max Maxfield, and embedded systems expert, Jack Ganssle, will debate as to just what is, and is not, and embedded system.
Like Us on Facebook

Datasheets.com Parts Search

185 million searchable parts
(please enter a part number or hit search to begin)
EE Times on Twitter
EE Times Twitter Feed
Top Comments of the Week