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Darkhorse litho technologies stay in NGL race

2/15/2012 08:30 AM EST
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Jason_Liu
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re: Darkhorse litho technologies stay in NGL race
Jason_Liu   2/19/2012 7:14:17 AM
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Perhaps, regarding as the viewpoint of mass-production, the approach to improve the common DOF of the different characteristics of pattern,ex. iso- vs. dense- ,or line vs. space, is more practical and economic than that to put all resource to enhance the resolution.

Diogenes53
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re: Darkhorse litho technologies stay in NGL race
Diogenes53   2/19/2012 5:16:20 AM
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The dream of e-beam direct write has been around as long as x-ray lithography, and just as successful. The e-beam problems of throughput, data management and error correction simply cannot be solved in time, or economically. EUV, or, more correctly, soft x-ray projection lithography, continues to suffer from very x-ray like problems of decades ago. The only technology with the potential to complement optical lithography is imprint, which essentially is optical lithography: it uses an I-line source, I-line resists, and quartz based photomasks. Defects are a more manageable challenge than those facing EBDW and SXPL (EUV), particularly in memory. Lithography will bifurcate into solutions for logic and solutions for memory.

Diogenes53
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re: Darkhorse litho technologies stay in NGL race
Diogenes53   2/19/2012 5:07:26 AM
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H

rick merritt
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re: Darkhorse litho technologies stay in NGL race
rick merritt   2/18/2012 2:13:45 AM
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I wonder if the co-existance of several litho techs will make the economics tougher (lower volumes for all).

resistion
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re: Darkhorse litho technologies stay in NGL race
resistion   2/18/2012 12:54:17 AM
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E-beam is more mature than optical for sure. But electrons, primary, photo-, or secondary, are prone to random disturbance. And they go into the substrate. So the interest in DSA, though it seems sensitive to the guiding pattern size.

ebmfuser
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re: Darkhorse litho technologies stay in NGL race
ebmfuser   2/17/2012 11:06:42 PM
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AND, the cost savings in masks alone would be enormous!!!

ebmfuser
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re: Darkhorse litho technologies stay in NGL race
ebmfuser   2/17/2012 11:04:02 PM
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Truly a shame that more 'professionals' don't look more seriously at e-beam lithography themselves, and not take the word of people in the photomask industry, who would directly be threatened if mask-less lithography came into popularity. E-beam litho has demonstrated nano-level capability for more than 20 years, with comparative overlay capability equaling the best aligners out there. Yes, throughput is an issue, but at 1/6 (or less) the cost of an good immersion stepper, you can buy several!!! Truth is that even the finest nano-imprint tool or EUV stepper will require masks, and they will only be available via e-beam lithography (as well as being ridiculously expensive and short lived). Direct write is a viable technology - today!

resistion
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re: Darkhorse litho technologies stay in NGL race
resistion   2/17/2012 9:18:37 AM
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The critical layer tools need to be double or higher throughput, along with the track.

resistion
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re: Darkhorse litho technologies stay in NGL race
resistion   2/17/2012 6:33:17 AM
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I think we can only count 10 nm and 7 nm, then what..and that would not be single patterning anymore either. CD variations on the order of lattice constants.

resistion
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re: Darkhorse litho technologies stay in NGL race
resistion   2/17/2012 6:19:31 AM
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EUV doesn't have so many nodes left. Unless you mean to include the next wavelength.

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