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DRAM, foundry logic in race to use EUV, says ASML

4/19/2012 12:24 PM EDT
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Diogenes53
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re: DRAM, foundry logic in race to use EUV, says ASML
Diogenes53   4/26/2012 1:43:42 AM
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In this same issue of EE Times: Source problems cause EUV revenue delay, says ASML Peter Clarke 4/19/2012 8:14 AM EDT LONDON Lithography equipment developer ASML Holding NV (Veldhoven, The Netherlands) has said that a delay in the availability of illumination power sources has prompted it to push out revenue recognition on the first two production EUV lithography machines, currently being assembled at the company's headquarters. Zzzzzzzzzzzzzz........ the more things change.......

Diogenes53
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re: DRAM, foundry logic in race to use EUV, says ASML
Diogenes53   4/26/2012 1:44:24 AM
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This was from the same EE Times issue:Source problems cause EUV revenue delay, says ASML Peter Clarke 4/19/2012 8:14 AM EDT LONDON Lithography equipment developer ASML Holding NV (Veldhoven, The Netherlands) has said that a delay in the availability of illumination power sources has prompted it to push out revenue recognition on the first two production EUV lithography machines, currently being assembled at the company's headquarters. Sound inevitable?

MarineDir
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re: DRAM, foundry logic in race to use EUV, says ASML
MarineDir   6/11/2012 9:53:00 AM
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The industry will be waiting for the next big player for EUV manufacturers. The manufacturer that is able to produce EUV litho machines for the market will stand to get an early lead, an because the global demand will be met by them, they will gain a sizeable share in the market as well. This would be an interesting development to follow, and hopefully there will be more updates on this. Mary - http://www.jensenmarinedirect.com

Diogenes53
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re: DRAM, foundry logic in race to use EUV, says ASML
Diogenes53   7/4/2012 2:22:20 PM
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The ONLY inevitabilities are death and taxes. I assure you EUV (x-ray!) is not inevitable.

Diogenes53
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re: DRAM, foundry logic in race to use EUV, says ASML
Diogenes53   7/4/2012 2:24:01 PM
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ASML is perfectly happy to sell two wildly profitable immersion tools for double patterning instead of one unprofitable jerryrigged, Rube Goldberg soft x-ray machine

resistion
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re: DRAM, foundry logic in race to use EUV, says ASML
resistion   7/4/2012 2:37:20 PM
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The fact is, 20 nm has come to pass without EUV. And EUV is already too slow for 20 nm and below. http://www.electroiq.com/articles/sst/2012/06/euvl-workshop-focuses-on-source-power-timing.html

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