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SRC clears path to 14-nm with directed self-assembly litho

5/24/2012 03:56 PM EDT
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any1
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re: SRC clears path to 14-nm with directed self-assembly litho
any1   5/24/2012 8:06:58 PM
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This is good stuff with great promise, but of course this is still a nascent technology that will not be manufacturing ready in time to stop Moore's law from stalling in the next few years. Perhaps if we hadn't spent so much money on EUV lithography then resources could have been made available to accelerate directed self-assembly technology years ago.

Les_Slater
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re: SRC clears path to 14-nm with directed self-assembly litho
Les_Slater   5/24/2012 9:03:10 PM
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Moore's law needs to be updated. Our real concern is work done per given real estate per unit time. There are power and cooling issues too.

R_Colin_Johnson
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re: SRC clears path to 14-nm with directed self-assembly litho
R_Colin_Johnson   5/24/2012 9:55:08 PM
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Directed self-assembly is not the whole answer, but it is an answer and its one that has the potential to touch other aspects of extending lithography down to sub-wavelength dimensions. I'm excited about what SRC and other researcher groups developing advanced copolymer formulations may be cooking up :)

resistion
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re: SRC clears path to 14-nm with directed self-assembly litho
resistion   5/26/2012 2:58:26 AM
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Self-assembly is an indication of natural molecular scales in polymers, good to note. Why ~20 nm?

wilber_xbox
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re: SRC clears path to 14-nm with directed self-assembly litho
wilber_xbox   5/26/2012 6:01:37 PM
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are there any buyers for this technology? DSA has been around for some time now so i missed the main advantage of this method over previous methods.

R_Colin_Johnson
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re: SRC clears path to 14-nm with directed self-assembly litho
R_Colin_Johnson   5/26/2012 8:28:12 PM
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SRC claims this is the first production ready use of directed self assembly--that previous demonstrations were just test structures, but that Stanford's technique is ready for 22-nm today, can be extended as-is to 14-nm, and is being developed for single-digit geometries by formulating new co-polymers. "Directed self-assembly (DSA)—a technology based on a concept that was virtually unknown outside of research labs a few years ago..." http://www.eetimes.com/electronics-news/4213705/Momentum-builds-for-directed-self-assembly

R_Colin_Johnson
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re: SRC clears path to 14-nm with directed self-assembly litho
R_Colin_Johnson   5/26/2012 8:29:05 PM
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The particular co-polymer here produces the 20-nm features, with other formulations being developed for single-digit geometries.

resistion
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re: SRC clears path to 14-nm with directed self-assembly litho
resistion   5/27/2012 6:13:18 AM
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Can 7 nm lines 7 nm apart reliably carry electrical signals? Not much room for barrier layers, even.

R_Colin_Johnson
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re: SRC clears path to 14-nm with directed self-assembly litho
R_Colin_Johnson   5/27/2012 11:14:27 AM
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We are fast approaching the lower limit, since the crystalline lattice of silicon, for instance, has a spacing of about 0.5 nm. But scientists who work with these tiny dimensions call .5nm, 5 angstroms, and the atoms themselves are much much smaller--measured in hundreds of picometers (1pm = 1/100th of an angstrom).

resistion
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re: SRC clears path to 14-nm with directed self-assembly litho
resistion   5/27/2012 4:58:27 PM
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That's an important perspective. Silicon nitride is at 0.8 nm, only 1/20 of 16 nm!

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