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TSMC on 450-mm wafers and lithography

9/5/2012 12:37 PM EDT
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resistion
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re: TSMC on 450-mm wafers and lithography
resistion   10/27/2012 3:15:12 AM
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A 300 mm EUV tool would be restricted to a single node, not worth it. Better to have 450 mm first and bridge tools.

resistion
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re: TSMC on 450-mm wafers and lithography
resistion   10/4/2012 3:09:52 PM
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Maybe "10 nm" is just original "14 nm" (~20 nm hp) plus 450 mm, just like "16 nm" is probably "20 nm" (~30 nm hp) plus finfet.

resistion
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re: TSMC on 450-mm wafers and lithography
resistion   9/6/2012 12:53:38 AM
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Well we know now "10 nm", "16 nm" may all be merely just names. What is the real half-pitch in these cases?

Peter Clarke
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re: TSMC on 450-mm wafers and lithography
Peter Clarke   9/5/2012 5:19:09 PM
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It looks Burn Lin was pushing back EUVL...again.

goafrit
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re: TSMC on 450-mm wafers and lithography
goafrit   9/5/2012 3:25:15 PM
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TSMC is doing well. But time has come for TSMC to start making product. Intel and Samsung are doing so.

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