LONDON – Imprint lithography firm Molecular Imprints Inc. said Thursday (Jan. 17) that one of its machines is being used by an unnamed semiconductor company to support the development of chip production on 450-mm diameter wafers. The company claimed that the availability of the machine would shorten the semiconductor industry's transition to 450-mm wafers by at least two years.
Molecular Imprints (Austin, Texas) said its Imprio 450 machine was accepted by the unnamed semiconductor company at the end of 2012. The unit is being used as part of a multi-year wafer services development contract, according to the company.
Last week, at the Industry Strategy Symposium organized by fab tool vendor trade group SEMI, Robert Bruck, a corporate vice president at Intel Corp., showed one of the first fully-patterned 450-mm diameter wafers.
The J-FIL imprint lithography technology has demonstrated 24-nm patterning with line edge roughness of less than 2-nm to 3 sigma and critical dimension uniformity to 1.2-nm 3 sigma. It offers the prospect of 10-nm patterning with single-step process.
"In an era where multi-year and multi-billion dollar optical lithography development programs are becoming the norm we were able to design, build and deliver an advanced nanoimprint platform in just one year from receiving the customer's purchase order," said Mark Melliar-Smith, CEO of Molecular Imprints, in a statement.
He added that the capabilities of the Imprio 450 were well aligned to the needs of semiconductor memory manufacturing but that the company is alos making progress towards placing J-FIL technology into high volume production of advanced CMOS devices.
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