Breaking News
News & Analysis

ISSCC: ASML says EUV best option at 10nm

Promising EUV results at 40W
2/19/2013 08:21 AM EST
17 comments
NO RATINGS
< Previous Page 3 / 9 Next >
More Related Links
View Comments: Newest First | Oldest First | Threaded View
Page 1 / 2   >   >>
resistion
User Rank
Manager
re: ISSCC: ASML says EUV best option at 10nm
resistion   6/13/2013 5:24:54 AM
NO RATINGS
The 2D feature resolution is still not beating 22 nm and roughness about 15% of that. Photon shot noise is not negligible anymore.

resistion
User Rank
Manager
re: ISSCC: ASML says EUV best option at 10nm
resistion   6/13/2013 5:02:45 AM
NO RATINGS
The SPIE material is publicly available: http://www.asml.com/doclib/investor/presentations/2013/asml_20130228_EUV_presentation_SPIE_public.pdf

resistion
User Rank
Manager
re: ISSCC: ASML says EUV best option at 10nm
resistion   2/26/2013 2:10:53 AM
NO RATINGS
SPIE Keynote from Intel showed EUV out at 10 nm (still in pilot), with only 193 nm extension being used for production at 2H 2015.

double-o-nothing
User Rank
Rookie
re: ISSCC: ASML says EUV best option at 10nm
double-o-nothing   2/24/2013 1:24:48 AM
NO RATINGS
SPIE Advanced Lithography this week is where the updates on lithography happen.

resistion
User Rank
Manager
re: ISSCC: ASML says EUV best option at 10nm
resistion   2/23/2013 10:26:30 PM
NO RATINGS
Why did they present this at ISSCC? The conference is about circuits and designs, not about devices and processes, don't even mention lithography!

Diogenes53
User Rank
Rookie
re: ISSCC: ASML says EUV best option at 10nm
Diogenes53   2/22/2013 1:53:04 AM
NO RATINGS
Bring on angstroms! The horse died when the name was changed from soft x-ray projection lithography to EUV. Who says words don't matter.

de_la_rosa
User Rank
Rookie
re: ISSCC: ASML says EUV best option at 10nm
de_la_rosa   2/21/2013 4:21:15 PM
NO RATINGS
I wonder if those resolution results are representative for high throughput conditions. They are flogging a dead horse!

pica0
User Rank
Rookie
re: ISSCC: ASML says EUV best option at 10nm
pica0   2/21/2013 2:05:32 PM
NO RATINGS
Any energy consumption estimations?

InVT
User Rank
Rookie
re: ISSCC: ASML says EUV best option at 10nm
InVT   2/20/2013 4:50:16 PM
NO RATINGS
I'm guessing if they develop a pellicle process they are going to have to bring it up well above 60W.

resistion
User Rank
Manager
re: ISSCC: ASML says EUV best option at 10nm
resistion   2/20/2013 1:58:18 AM
NO RATINGS
Bi-directional M1 is commonly practiced but not necessary. In fact, given EUV's inherent X-Y asymmetry, unidirectional will always be lithographically preferred.

Page 1 / 2   >   >>
Flash Poll
Radio
LATEST ARCHIVED BROADCAST
Join our online Radio Show on Friday 11th July starting at 2:00pm Eastern, when EETimes editor of all things fun and interesting, Max Maxfield, and embedded systems expert, Jack Ganssle, will debate as to just what is, and is not, and embedded system.
Like Us on Facebook

Datasheets.com Parts Search

185 million searchable parts
(please enter a part number or hit search to begin)
EE Times on Twitter
EE Times Twitter Feed
Top Comments of the Week