BRUSSELS, Belgium Mike Mayberry, director of component research at Intel Corp. has looked down the highway of conventional silicon development and reckons things become foggy beyond about the 7-nm node.
And the methods of pre-competitive collaborative research that have served the industry so far will have to change and be opened up, Mayberry said, as he gave a keynote speech to the IMEC Technology Forum being held here.
Local research institute IMEC works in collaboration with all the major semiconductor companies and its two-day annual forum provides an opportunity for engineering managers and senior executives from around the world to congregate.
Mayberry said that everything up to the 10-nm CMOS node which is in
development at Intel and will ramp production in 2015 - is effectively
done. However, he said his job depends on being able to continue to
double density and performance every two years beyond that, something
for which the way forward is much less clear.
There are numerous
ideas that may provide a continuation of silicon such as the
introduction of germanium, III-V materials into the transistor channel
and the move from fins to vertical wires or dots with gate-all-around
(GAA) structures. However, once all of that has been worked through, at
great cost, where do you go next, he asked the audience.
surprisingly Intel has been contemplating this issue and a few years ago
created an internal nanoelectronics research initiative, which has come
up with about 20 different ideas for information switching
technologies. Mayberry showed a slide with several ideas based on
spintronics were information is contained in the spin of electrons.
several ideas probably need to be pursued at the same time because it
is likely to take a decade or more to bring a radical change in the
fundamental operation of electronic circuits to maturity. And all this
has to be done in a climate of business consolidation, Mayberry said.
Mike Mayberry, director of component research at Intel, talks to a packed auditorium at the IMEC Technology Forum.