PARIS Scientists and companies from Europe and Brazil have joined forces in an EU-backed project that aims to develop design methods and EDA tools in a view to remove the limitations in physical implementation effectiveness associated with technology scaling and advanced sub-wavelength lithography.
The three-year project, dubbed Synaptic (SYNthesis using Advanced Process Technology Integrated in regular Cells, IPs, architectures, and design platforms), targets the optimization of manufacturability and the reduction of systematic variations in nanometer technologies through exploitation of regularity at the architectural, structural and geometrical levels.
Partners said they intend to define a methodology and associated suite of design tools which extract regularity at the architectural and structural level and automate the creation of regular compound cells which implement the functionality of the extracted templates.
The cell creation will employ Restricted Design Rules (RDR's) and other regularity techniques at the geometrical level to maximize manufacturability and reduce systematic variations, the Synaptic consortium added.
The project will also include a study of the effects of RDR's on SRAM in terms of performance and manufacturability and the subsequent definition of a set of RDR's, which allow manufacturability optimization for logic functions while remaining compatible with SRAM design rules.
Led by Nangate A/S (Copenhagen, Denmark), the Synaptic project includes STMicroelectronics, Thales, IMEC and Politecnico di Milano (Italy), Universitat Politècnica de Catalunya (Spain) and Universidade Federal do Rio Grande do Sul (Brazil).