Design Con 2015
Breaking News
Design How-To

Do annular electrodes present a scalable PCM solution? - Part 2

5/14/2013 04:11 PM EDT
5 comments
NO RATINGS
Page 1 / 3 Next >
More Related Links
View Comments: Oldest First | Newest First | Threaded View
resistion
User Rank
CEO
re: Do annular electrodes present a scalable PCM solution? - Part 2
resistion   5/20/2013 4:28:33 AM
NO RATINGS
If you define F as size of the nanoparticle, this cell will be much greater than ^2.

resistion
User Rank
CEO
re: Do annular electrodes present a scalable PCM solution? - Part 2
resistion   5/20/2013 4:34:20 AM
NO RATINGS
Much greater than 10F^2.

Ron Neale
User Rank
Blogger
re: Do annular electrodes present a scalable PCM solution? - Part 2
Ron Neale   5/20/2013 8:53:39 AM
NO RATINGS
Resistion- Perhaps you can share with us the basis of your conclusion. In my figure 9 above, consider the example of 5nm oxide discs (your nano particles) and a fill factor of 50% for a 20 x 20nm (I.e F =20nm) aperture just over 10 discs are required. Even if you square-packed the discs in the same 20 x 20nm aperture so they were all touching each other a simple calculation shows 16 discs would be required. The nano particles (discs) are sub-lithographic features so the number of them and the diameter should be independent of the lithographic feature size F. Assuming you are using F in the conventional manner as minimum lithographic feature size in my square aperture example the cell size will be dependent on the lithographic feature size as 4F^2. The main questions that have to be answered for self-assembly (S-A) is can the discs be produced with diameters of less than 5nm and more importantly will the claimed low reset current density be observed.

resistion
User Rank
CEO
re: Do annular electrodes present a scalable PCM solution? - Part 2
resistion   5/20/2013 1:36:22 PM
NO RATINGS
Maybe you can say hp is 20 nm and the cell is 4*hp^2, but if hp is 4x diameter, the cell is 4*16*d^2 or 64d^2. Some schools use hp as F some use d as F. Although hp is more in tune with lithographic requirements, d is more in tune with actual process requirements.

Ron Neale
User Rank
Blogger
re: Do annular electrodes present a scalable PCM solution? - Part 2
Ron Neale   5/20/2013 3:51:57 PM
NO RATINGS
Resistion I think it is always possible to affix any or value definition you wish to hp (usually defined as half distance between minimum features). The self assembly (S-A) process) must be considered as independent of lithography. The distance between the S-A oxide discs will be defined by the chemical-oxidation process and added as a sub-lithographic overlay onto the best conventional lithographic process; in my example 20nm lithography. The S K Hynix 1Gb PCM that I covered in one of my earlier EETimes PCM papers was an example of a 42nm minimum feature size resulting in a 2F^2 cell with an hp of 42nm. Again, in Part 2 above my d was the diameter of the oxide discs and that has nothing to do with lithography.

Radio
NEXT UPCOMING BROADCAST
EE Times Senior Technical Editor Martin Rowe will interview EMC engineer Kenneth Wyatt.
Top Comments of the Week
Like Us on Facebook

Datasheets.com Parts Search

185 million searchable parts
(please enter a part number or hit search to begin)
EE Times on Twitter
EE Times Twitter Feed
Flash Poll