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Under the Hood: 45 nm: What Intel didn't tell you

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Patrizio
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re: Under the Hood: 45 nm: What Intel didn't tell you
Patrizio   1/25/2008 3:16:51 PM
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Don, Nice review. Also interesting to note is the lithographic approach to imaging using dry 193nm. The Inverse Lithography Technology technique used to generate a pixelated mask really enables process latitude. They will disclose a lot of this at the years SPIE Advanced Lithography conference. Luminescent has hardware accelerators and software to Fourier transforn the desired image into treated design data but at the expense of curvilinear features. Intel seems to overcome that by working exclusively with rectilinear features which align with the vector shaped ebeam write tools that write the masks as well as the inspection systems that validate the mask integrity. Patrick patrickmartin@vsea.com

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