Marlborough, Mass. Rohm and Haas Company will introduce its new line of
Enlight products for photovoltaic manufacturers at the 23rd European Photovoltaic Solar Energy Conference and Exhibition (PVSEC) in Valencia, Spain, September 1-5. The Enlight product suite of materials is said to improve traditional solar cell processing by increasing cell efficiency and increasing manufacturing yields.
New products include the following:
The Enlight SilverPlate 620 for PV metallization offers an improved Light Induced Plating (LIP) solution over the company's first generation product. This new technology can increase cell efficiencies by as much as 0.6% compared to standard paste
The Enlight JetResist 1310 for PV imaging is a hot melt ink that is compatible with most drop-on-demand inkjet systems. This product offers a resolution capability down to 60 microns and is compatible with most etches including BOE, HF and cupric chloride.
The Enlight JetStrip 1210 Stripper is optimized to remove JetResist 1310 with fast stripping speeds. It can be used in both spray or immersion equipment configurations, and will not attack underlying emitter layers, said the company.
The Enlight Wafer Clean 320 Series for PV cleaning is optimized to allow for customized cleaning and etching performance while being compatible with mono-crystalline and multi-crystalline substrates.