PARIS Tanner EDA, a division of Tanner Research Inc. (Monrovia, Calif.), and IC Mask Design Ltd. (Limerick,
Ireland) have joined forces to develop a toolset aimed at accelerating analog layout design.
The collaboration involves licensing IC Mask Design's patented layout acceleration technology and integrating it into Tanner EDA's custom IC design suite.
Tanner EDA said it expects to release a toolset based on IC Mask Design's proprietary technology in the second quarter of 2010. The toolset, partners claimed, will accelerate and semi-automate physical design activities to improve productivity and quality.
Tanner EDA said it anticipates that designers will be able to automatically generate devices and structures that are silicon-aware and are contextually tuned for their own specific layouts.