PARIS Mentor Graphics Corp. (Wilsonville, Ore.) said it has qualified its Calibre LFD (Litho-Friendly-Design) tool for Taiwan Semiconductor Manufacturing Corp.'s 28nm process.
The Calibre LFD solution, Mentor claimed, enables designers to identify lithography hotspots in the design flow and make tradeoff decisions early, resulting in a design that is more robust and less sensitive to variations across the lithographic process window.
"At advanced nodes, designers not only need access to an exact copy of TSMC's process models to accurately assess lithography issues, they also need those process models incorporated into EDA tools that then drive resolution of any issues encountered," stated Shauh-Teh Juang, senior director of Design Infrastructure Marketing at TSMC.
Juang noted that the collaborative solution includes TSMC's Unified DFM framework, an encapsulated LPC engine and Calibre LFD.
Such combination, he continued, "allows our mutual customers to identify and resolve design-related litho hotspots at TSMC's most advanced process, while continuing to work within the same Calibre verification platform they have been using for multiple generations."