PARIS Japan's Renesas Technology Corp. announced it has selected Synopsys' Proteus optical proximity correction (OPC) software for 28nm development.
By utilizing Synopsys' Proteus, Renesas said it has achieved "aggressive OPC accuracy specifications with improvement of process robustness."
Proteus, Synopsys claimed, provides an environment for performing full-chip proximity correction, building models for correction, building models for correction, and analyzing proximity effects on corrected and uncorrected IC layout patterns.
Proteus has benefited from the 1.6x performance improvement of each x86 generation, and Synopsys noted that it has delivered more than 12x better performance over the last three years.
"Process-window-aware OPC accuracy was a very important component at this aggressive technology node, but minimizing the cost of ownership was also required," stated Hitoshi Sugihara, department manager, DFM & Digital EDA Technology Dept., Design and Development Unit at Renesas Technology Corp.
Sugihara added: "Proteus' compact physical models, user-programmable recipe with powerful function components, and highly scalable OPC engine allow us to achieve our objectives within a relatively short development cycle."