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Graphene Patterned at Room Temp

Shadow mask etched for flexible substrates
5/5/2016 08:13 AM EDT
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R_Colin_Johnson
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Re: Graphene Maturing
R_Colin_Johnson   5/11/2016 9:00:17 AM
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They can use finer grain lasers or go to other lithographic techniques to get down to nanoscale, but big breakthrough is the ease of making and transferrinbg graphne patterns at room temperature--droppiing the cost of fabs below a million. That would roll back the industry's dependence on big players like TSMC and turn fab into a cottage industry!

DVoid
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Re: Graphene Maturing
DVoid   5/11/2016 12:42:00 AM
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"but there is a limit on how fine the shadow mask can be etched".  What is the main roadblock at this time?  Is it the laser etching--how fine the cuts can resolve?  What would they do to improve it?  Thanks, Colin.

R_Colin_Johnson
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Graphene Maturing
R_Colin_Johnson   5/6/2016 9:47:27 AM
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Graphene has long been considered silicons most promising succerssor, but lacked some qualities that it needed. For instance, magnetism is a desireable property for the spintronix devices that will encode 1s and 0s on the magetic spin of individual electrons. LOOK FOR HOW TO ADD MAGNETISM TO GRAPHENE IN A STORY I SUBMITTED FOR NEXT WEEK!

This story, in some ways, tells an even more interesting story. Instead of spending billions to get to the next silicon scaling node, why not just spend thousands to pattern graphene circuits at room temperature on flexible substrates. This story tells you how.

True today their shadow mask techniques can only resolve micron resolutions, but the end of the silicon roadmap is not until 2023--seven years away. The authors say that gives them ample time to scale now to the nanometer range. Check it out. And don't forget to watch for "Adding Magnetism to Graphene's Toolbox" next week.

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