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EUV Progress, Hurdles Cited

Intel, Samsung give updates at SPIE
2/28/2017 07:43 AM EST
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resistion
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No single patterning for EUV?
resistion   3/7/2017 7:50:35 AM
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It also described use of EUV for a single patterning step, eliminating both SAQP and triple blocking. However, this alternative could add both cost and complexity, it said.

That's a surprising statement, yet seemingly hiding something. EUV single patterning more costly than SAQP?

Violoncelles
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Pellicles to keed defects off reflection surface
Violoncelles   3/1/2017 10:17:00 AM
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"pellicles to keep defects off EUV wafers" ????
Pellicles are meant to keep defects off EUV masks , or at least off the reflection surface of the EUV masks.

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