REGISTER | LOGIN
Breaking News
News & Analysis

ASML Claims Major EUV Milestone

7/14/2017 02:01 AM EDT
13 comments
NO RATINGS
Page 1 / 2 Next >
More Related Links
View Comments: Newest First | Oldest First | Threaded View
Page 1 / 2   >   >>
resistion
User Rank
Author
Re: Still not enough
resistion   7/18/2017 9:51:54 AM
Good catch. So it looks like 250W is not repeatable or not sustainable, at this point.

Source stability was always an issue, even at lower power.



double-o-nothing
User Rank
Author
Re: Still not enough
double-o-nothing   7/17/2017 6:07:04 AM
NO RATINGS
Keep in mind, by definition the resist is supposed to absorb more than the pellicle, and the layers under the resist (e.g., dielectric to be patterned) are not good thermal conductors. So the heating only gets worse.

Gondalf
User Rank
Author
Re: Still not enough
Gondalf   7/16/2017 6:44:32 AM
NO RATINGS
It was only a question, calm down. 

realjjj
User Rank
CEO
Re: Still not enough
realjjj   7/15/2017 8:23:17 AM
NO RATINGS
It's their second gen 7nm, the node where they insert EUV.

And I am not a TSMC shareholder nor am i following their financials but there are interesting bits in their results calls.

I could do without the tone, you are maing a habbit out of it and if that continues i have no choice but to ignore you. Not every comment here has to be a positive comment about your beloved Intel. It's not rational to have feelings for corporations and it's much worse when you invest based on that.

Gondalf
User Rank
Author
Re: Still not enough
Gondalf   7/15/2017 4:39:17 AM
NO RATINGS
What is N7+ ?? a game?? an internal number scheme?? 

So sorry i am not an TSMC shareholder, care nothing of their results and conference call :).

realjjj
User Rank
CEO
Re: Still not enough
realjjj   7/14/2017 2:40:19 PM
Was taking a look at TSMC's Q2 results call transcript and noticed this:

Mark Liu - Taiwan Semiconductor Manufacturing Company Limited - Co-CEO, President and Additional Director

"The 250-watt still happen in the laboratory, and we don't count on that high number to do the cost reduction. Currently, we estimate if we do well on 125, for example, it will be sufficient enough for us to make the cost reduction."

He was talking about N7+

resistion
User Rank
Author
ASML misstatements
resistion   7/14/2017 1:08:03 PM
NO RATINGS
ASML would be clearly misstating "fewer variables". Any lithographer would know EUV is inherently more complicated than immersion with many more parameters, related to the mask as well as the tool itself, and even the resist. Secondary electron yield is a new one, for example.

resistion
User Rank
Author
Re: Still not enough
resistion   7/14/2017 1:00:13 PM
NO RATINGS
If it were a self-aligned SADP process requiring a cut mask, there's indeed no incentive for EUV. At most two cut masks for SADP, having one by EUV is not worth it. In that case, LELELE may not be too bad either, if overlay control is good. Single exposure EUV had been the preference but it is still not debugged, so to speak. You have a 36 nm metal pitch and a ~50 nm gate pitch, just don't mix well on the EUV tool. On the other hand, gate pitch can't be shrunk easily anymore.

resistion
User Rank
Author
Re: Still not enough
resistion   7/14/2017 12:53:45 PM
NO RATINGS
It's more about CD control by dose than roughness looking a little better. The key is it's not purely random but correlated to locations of lower dose regions, which is not really addressed by exposure-independent smoothing. More obviously, though, smoothing happens after the resist CD is already defined, so it adds extra CD bias and also likely some resist loss. It's more significant bias for more severe roughness. It is particularly severe for via layers and cuts. It could go to 60 mJ/cm2 or higher.

paul.jhnson
User Rank
Rookie
Breakthrough
paul.jhnson   7/14/2017 12:50:57 PM
NO RATINGS
ASML has been breaking through EUV for the last 10 years. They only thing that has really been breaking through is how much money they have been able to make with the EUV dream. Let's see how reliable the tools/process is (not) before even thinking about cost-effectiveness.

Next, we'll hear LiarFoundries claiming they have a break-through EUV process in production by year end.

Page 1 / 2   >   >>
Like Us on Facebook
EE Times on Twitter
EE Times Twitter Feed