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Chip Execs More Bullish on EUV

Surveys take temperature on litho, masks
9/11/2017 12:01 PM EDT
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resistion
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Here's one for the naysayers
resistion   9/19/2017 5:26:19 PM
Google US20160349412

manomano
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Pending Review
manomano   9/18/2017 4:23:14 AM
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kadvacorp
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kadvacorp   9/18/2017 12:34:03 AM
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double-o-nothing
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EUV masks take much longer write time
double-o-nothing   9/16/2017 4:23:57 AM
For sure, EUV masks will take much longer to write than immersion masks. Immersion masks only print down to ~40 nm (half-pitch), while EUV needs to print down to 20 nm and smaller and may also need assist features effectively as small as 10 nm (40 nm on the mask).  Going from 40 to 20 nm, the write current should be reduced by more than a factor of 2, while the dose needs to go up 4x for shot noise. Going from 40 to (effective)10 nm, the write current should be reduced ~7x, while the dose needs to go up another 4x for shot noise. This leads to at least 8x increase in write time for 20 nm main features and over 100x increase in write time for the 10nm assist features on the EUV mask. And we haven't taken time out for defect handling. A single e-beam mask writer would not be able to handle it. Immersion masks take 1-2 days to write already. That is why the multi-beam writer survey is tied in with the EUV survey. The survey indicates the multi-beam pushed out about a year.

resistion
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Surveys: do they tell anything
resistion   9/11/2017 11:26:58 PM
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Do surveys beat data for decision making? Even if you trust them, it looks like the original 2018 timing has less confidence this year than last year.

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