Breaking News
News & Analysis

Darkhorse litho technologies stay in NGL race

DSA is hot
2/15/2012 08:30 AM EST
15 comments
NO RATINGS
< Previous Page 2 / 2
More Related Links
View Comments: Oldest First | Newest First | Threaded View
<<   <   Page 2 / 2
resistion
User Rank
CEO
re: Darkhorse litho technologies stay in NGL race
resistion   2/18/2012 12:54:17 AM
NO RATINGS
E-beam is more mature than optical for sure. But electrons, primary, photo-, or secondary, are prone to random disturbance. And they go into the substrate. So the interest in DSA, though it seems sensitive to the guiding pattern size.

rick merritt
User Rank
Author
re: Darkhorse litho technologies stay in NGL race
rick merritt   2/18/2012 2:13:45 AM
NO RATINGS
I wonder if the co-existance of several litho techs will make the economics tougher (lower volumes for all).

Diogenes53
User Rank
Rookie
re: Darkhorse litho technologies stay in NGL race
Diogenes53   2/19/2012 5:07:26 AM
NO RATINGS
H

Diogenes53
User Rank
Rookie
re: Darkhorse litho technologies stay in NGL race
Diogenes53   2/19/2012 5:16:20 AM
NO RATINGS
The dream of e-beam direct write has been around as long as x-ray lithography, and just as successful. The e-beam problems of throughput, data management and error correction simply cannot be solved in time, or economically. EUV, or, more correctly, soft x-ray projection lithography, continues to suffer from very x-ray like problems of decades ago. The only technology with the potential to complement optical lithography is imprint, which essentially is optical lithography: it uses an I-line source, I-line resists, and quartz based photomasks. Defects are a more manageable challenge than those facing EBDW and SXPL (EUV), particularly in memory. Lithography will bifurcate into solutions for logic and solutions for memory.

Jason_Liu
User Rank
Rookie
re: Darkhorse litho technologies stay in NGL race
Jason_Liu   2/19/2012 7:14:17 AM
NO RATINGS
Perhaps, regarding as the viewpoint of mass-production, the approach to improve the common DOF of the different characteristics of pattern,ex. iso- vs. dense- ,or line vs. space, is more practical and economic than that to put all resource to enhance the resolution.

<<   <   Page 2 / 2
Flash Poll
Radio
LATEST ARCHIVED BROADCAST
EE Times editor Junko Yoshida grills two executives --Rick Walker, senior product marketing manager for IoT and home automation for CSR, and Jim Reich, CTO and co-founder at Palatehome.
Like Us on Facebook

Datasheets.com Parts Search

185 million searchable parts
(please enter a part number or hit search to begin)
EE Times on Twitter
EE Times Twitter Feed