Earlier this year
an Intel executive said the company believes it could make chips
economically even down to 10-nm design rules without EUV, using quad
patterning. Intel is believed to generally have higher costs of
manufacturing than the rest of the industry, due to the relatively high
price for its processors.
Intel, Samsung and TSMC have separately
invested billions of dollars this year in ASML which is making the EUV
systems. EUV requires a more powerful light source now in development at
Cymer, which ASML acquired this year
the existing weak light source, today’s EUV systems pattern less than
20 wafers an hour. Chip makers need systems that can pattern more than
100 wafers/hour, said Ronse.