Chip makers must move to the “very complex” process of double patterning with immersion lithography starting at 20 nm, Patton said. But IBM has worked on ways to hide much of that complexity under either a standard cell design flow or for more advanced users a custom flow based on a relatively simple algorithm he added.
IBM has been mostly irrelevant to semiconductor process technology for at least a decade. I doubt many outside IBM can clear state why they even still do it. They certainly don't make any money from it. Yerning for the glory days perhaps?
That is the length of the whole unit cell. There are more atoms within the cell since it is a diamond crystal structure. Actual figures depend on orientation but for a 100 direction it would be 4x that.
Patterning at 7nm is obviously tough but sounds people think it can be done...but is Mosfet still working at 7nm?...what is Ion/Ioff ratio?...how many dopant atoms are within transistor volume? what about statistical variations that could be huge?
David Patterson, known for his pioneering research that led to RAID, clusters and more, is part of a team at UC Berkeley that recently made its RISC-V processor architecture an open source hardware offering. We talk with Patterson and one of his colleagues behind the effort about the opportunities they see, what new kinds of designs they hope to enable and what it means for today’s commercial processor giants such as Intel, ARM and Imagination Technologies.