Phase Shifting and OPC Address Subwavelength Challenges
			by Linard Karklin Phase shifting and optical proximity correction can help designers to ensure that current manufacturing processes will render deep-submicron and nanometer designs according to specifications
		PLDs and Their Users Benefit from In-Field Reconfiguration Options
			by Barry Flannaghan and Martin S. Won Reconfiguring PLDs in the field offers users customization and allows vendors to provide support without leaving the office.
		Dreaming Up a New Methodology for Physical Migration of Hard IP
			by Jon Levi In the quest for the grail of IP reuse, a physical migration software tool outshines simple optical shrinkage in translating hard IP for use in smaller processes.
		Modeling Substrate Effects in RF Integration
			by Didier Belot and Tallis Blalack Mixed-signal designers can save a wealth of time and money by simulating substrate parasitic effects rather than waiting weeks for test chips to return from the fab.
		Focus Report: Design Libraries
			by Gil Bassak Design libraries, while helping to harness galloping process technology to a spectrum of diverse applications, are riding out a storm of different pricing strategies.
		Editorial
			by Tets Maniwa The Hardware Under the OS Wars
		Inside HDL
			by Yuri Tatarnikov Making Verilog Models Compatible with VHDL VITAL Level O Models
		Viewpoint
			by Steve Wang Verification--Just How Much Is Enough?
		In The News
		Tools and Technologies