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resistion
The 22 nm release is still early, even by Intel's schedule. It could mean 10 nm, ...
kinnar
It is true that Tri-Gate will be giving better performance compared to existing ...
Intel putting fins on at 22 nm
Don Scansen
5/4/2011 12:39 PM EDT
Targeting tablet market
Today's partially-depleted SOI is not enough for the 22-nm node meaning the next generation of fully-depleted (FD-SOI) devices is necessary. Although FD-SOI could provide the performance benefits required at 22-nm, Intel claims it will add 10 percent to the manufacturing cost while the Tri-Gate process adds only two to three percent. The Tri-Gate process builds upon earlier high-k metal gate technology that will continue with Intel's 22-nm platform.
For a while now, Intel has touted the capability to tailor transistors for highest performance or lowest power and all points in between. 45- and 32-nm technology platforms from Intel have allowed the chip architects and product people to offer compromises for computing capability and power consumption specific to the application.
With the 22-nm Tri-gate process, Intel feels it is ready to not only move into but become a leader in the tablet and smartphone space. Intel created the netbook segment with Atom. The market for netbooks continues to create sockets for Intel to fill. There has never been much competition for them in this space. Atom was widely adopted with low cost as its main design spec. That satisfied the demand for netbooks, but Atom had not yet established a beach head in smart phones due to the multi-chip solution and power consumption.
The product side of the analyst briefings were provided by Stephen Smith, who heads up a new product group devoted to netbooks and tablets. Although Intel is known as a server-desktop-laptop player, Smith pointed out that the most recent offerings in the Atom line at 32-nm have begun to push them further into the tablet and smartphone market. However, the flexibility for lower power consumption or much higher performance in a reduced power envelope with 22-nm Tri-Gate has the potential to make Intel a serious player as they take a big step beyond netbooks.
Today's partially-depleted SOI is not enough for the 22-nm node meaning the next generation of fully-depleted (FD-SOI) devices is necessary. Although FD-SOI could provide the performance benefits required at 22-nm, Intel claims it will add 10 percent to the manufacturing cost while the Tri-Gate process adds only two to three percent. The Tri-Gate process builds upon earlier high-k metal gate technology that will continue with Intel's 22-nm platform.
For a while now, Intel has touted the capability to tailor transistors for highest performance or lowest power and all points in between. 45- and 32-nm technology platforms from Intel have allowed the chip architects and product people to offer compromises for computing capability and power consumption specific to the application.
With the 22-nm Tri-gate process, Intel feels it is ready to not only move into but become a leader in the tablet and smartphone space. Intel created the netbook segment with Atom. The market for netbooks continues to create sockets for Intel to fill. There has never been much competition for them in this space. Atom was widely adopted with low cost as its main design spec. That satisfied the demand for netbooks, but Atom had not yet established a beach head in smart phones due to the multi-chip solution and power consumption.
The product side of the analyst briefings were provided by Stephen Smith, who heads up a new product group devoted to netbooks and tablets. Although Intel is known as a server-desktop-laptop player, Smith pointed out that the most recent offerings in the Atom line at 32-nm have begun to push them further into the tablet and smartphone market. However, the flexibility for lower power consumption or much higher performance in a reduced power envelope with 22-nm Tri-Gate has the potential to make Intel a serious player as they take a big step beyond netbooks.
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mescusag
5/4/2011 9:30 PM EDT
Picture please
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VolsEE96
5/5/2011 1:12 AM EDT
MugFET. Nice. 'Muggle' for short?
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Les_Slater
5/5/2011 11:15 AM EDT
Anyone got an estimated relative speed/power performance between this and next generation ARM?
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wilber_xbox
5/6/2011 1:16 AM EDT
Here is very cool youtube video
http://www.youtube.com/watch?v=YIkMaQJSyP8
Link for more info:
http://newsroom.intel.com/community/intel_newsroom/blog/2011/05/04/intel-reinvents-transistors-using-new-3-d-structure
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kinnar
5/6/2011 10:57 PM EDT
It is true that Tri-Gate will be giving better performance compared to existing 32nm Technology getting manufactured upon, but still Intel will have to come out with some better processor variant that will be able to compete ARM IPs. As the market is getting developed over ARM these days within a year or two the scenario will get changed completely and it will become hard to find Intel processors in mobile devices.
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resistion
5/8/2011 12:13 PM EDT
The 22 nm release is still early, even by Intel's schedule. It could mean 10 nm, there will be no silicon channel, not even fully depleted. Otherwise, it would be preferable to start to offer finfet at 14 nm.
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