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Mentor Insights

Brian Bailey

11/27/2012 7:52 PM EST

Consolidated listing of blog from the folks at Mentor Graphics.

Parasitic extraction in the age of double-patterning, Carey Robertson

Rethinking communications: Automating tapeout review reporting, Yijun Tong

It is time to take SoC verification out of the lab, Richard Pugh

Chip Integration: Solving Duplicate Name Conflicts During File Merging, Yijun Tong

LVS Debug: The Good, The Bad, and The Future, Srinivas Velivala

Power domain verification: Beyond traditional DRC, LVS and ERC, Srinivas Velivala

Conquering Behemoth Designs, Andy Inness

Challenges in chip integration, Joe Davis

Interconnect Modeling at 20nm – More of the Same or Completely Different? Carey Robertson

Density Requirements at 28 nm, Joe Davis

Calibre PERC: Preventing Electrical Overstress Failures, Carey Robertson

Successful Adoption of DFM, Mark Redford - Cambridge Silicon Radio, and Jean-Marie Brunet – Mentor

Location Is Everything: Improving Performance with Interactive LDE Estimation, Ahmed F. Abo-ElHadeed, Amr Essam, Amr M.S. Tosson, Ahmed Ramadan, Mohamed Dessouky.

Critical Area Analysis and Memory Redundancy, Simon Favre

Virtual vs. Physical Prototyping, John Isaac

System Performance Analysis and Software Optimization Using a TLM Virtual Platform, by Mike Bradley and Jon McDonald

Debugging for antenna issues in copper processes, John Ferguson and Vigen Boyajyan

Design optimization of flip-chip packages integrating USB 3.0, by Rod Duzinski - Mentor, Manoj F. Nachnani - Enabling Solutions, Inc.

Evolution of manufacturing closure for advanced nodes (Part 3), Ivailo Nedelchev, Sudhakar Jilla

Attofarad accuracy for high-performance memory design, Claudia Relyea

Evolution of manufacturing closure for advanced nodes (Part 2), Ivailo Nedelchev, Sudhakar Jilla

The War Is Over: Using C++ and System C in One Tool, One Flow, Thomas Bollaert and Mike Fingeroff

Ease production at 65nm with DFM, Jean-Marie Brunet - Mentor, Mark Redford, Colin Thomas and Mark Scoones - Cambridge Silicon Radio

EDA focus shifts to system level design, Walden Rhines

Evolution of manufacturing closure for advanced nodes (Part 1), Ivailo Nedelchev, Sudhakar Jilla

How to instrument your design with simple SystemVerilog assertions, Ping Yeung

Wither Interoperability, the myth of the grand unifying EDA database, Linda Fosler

Brian Bailey – keeping you covered


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