Photronics, Micron team for photomask development

Photronics (Brookfield, Conn.) is investing $135 million over the next three years into the venture, while Micron is contributing its existing photomask technology facility located at its Boise, Idaho headquarters to the partnership, to be known as MP Mask.

The two companies have sealed a technology license agreement and supply arrangement for the products coming out of the centre, which will be 50.01 percent owned by Micron.

The companies also said Monday (May 8) they intend to build an independent NanoFab in Boise, Idaho, that will be operated by Photronics for volume production of advanced technology photomasks.

Photronics' investment in the facility, based on technology developed by the joint venture, is expected to be between $100 million to $150 million and will include new capital in addition to redeployed assets.

The companies say MP Mask would “create the industry's most advanced photo mask supply, and will manufacture products for the most advanced applications for Micron and other Photronics customers.”

The facility is expected to be completed and to begin qualification by the end of 2007.

Michael Luttati, Chief Executive Officer of Photronics said: "MP Mask is providing Photronics with the ability to obtain and implement a competitive advantage to the industry at a time when technology partnerships represent a critical area of differentiation. Through close development collaboration with Micron, MP Mask will deliver processes that result in production-worthy photomasks that optimize wafer fab yields.”

Mark Durcan, Chief Operating Officer of Micron Technology, added: "The combined expertise of Micron and Photronics in the areas of advanced photomask technology development and fabrication will enable Micron to meet its reticle demands for increasingly high-density, low-power semiconductor devices."

Randal Chance will serve as general manager of MP Mask, and Durcan will serve as chairman of the board of managers. Work at the new center will build on and support the developments into photmasks already under way at Photronics and Micron.