Photronics agrees to make masks for MaskTools' CPL

BROOKFIELD, Connecticut -- Photronics Inc. has agreed partner with ASML MaskTools Inc. and provide masks for the CPL (chromeless phase lithography) technology developed by ASML MaskTools, the company said Wednesday (December 17, 2003).

CPL is a resolution enhancement technique that enables low k1 lithography at advanced manufacturing process nodes, Photronics added.

"They [Photronics] will provide value to the program through their expertise and experience in high volume mask manufacturing," said Dinesh Bettadapur, president and chief executive officer of ASML MaskTools, in a statement. "Establishing an efficient mature mask making infrastructure is one of the keys to enabling the adoption of a new technology such as CPL."

A single mask, single exposure resolution enhancement technique, CPL can be broadly applied to logic and memory devices and is primarily targeted toward critical gate and contact layers.

MaskTools has two software tools to help customers implement CPL. These are: CPL imaging simulation tool and a CPL mask data conversion software program. Photronics is expected to deliver CPL masks.

"CPL technology...represents a very viable solution for extending optical lithography well beyond 90 nanometers," said Chris Progler, Photronics' chief scientist, in the same statement.

As part of the agreement, Photronics and ASML are to collaborate on the development of a CPL manufacturing flow that is optimized for Photronics' mask making process. ASML is to provide Photronics with an R&D license for its CPL technology patents encompassing the mask making, wafer imaging, and software implementation domains.