EU consortium to fund nanotechnology, nano-imprint litho

The consortium, called Emerging Nanopatterning Methods (NaPa), has been granted 16 million euros (US$19.9 million) in funding from the EU. NaPa will focus on the research and development of production techniques for nano-structuring and multifunctional polymers.

One of the members of the consortium is Sweden's Obducat, a supplier of equipment for nano-imprint lithography applications. The consortium, which is scheduled to last for at least four years commencing March 2004, is also expected to investigate technology related to nano-imprint lithography.

All the results emerging from Obducat activities within the project would remain property of Obducat, said Patrik Lundstrm, chief executive officer of the Malmo-based company. "The work regarding specification of our part of the NaPa project has been going on for quite some time," he said. "Obviously, it is most encouraging that Obducat has been accepted as a partner within the consortium as well as the fact that EU -- clearly reflected in the project budget -- acknowledges the huge potential within nanotechnology. This gives additional credibility to the expected industrial breakthrough for nano-imprint lithography and this is very positive for Obducat."