Molecular Imprints, MIT reach licensing agreement

AUSTIN, Texas — Molecular Imprints Inc. (MII), a supplier of nano-imprint lithography equipment, has signed an exclusive licensing agreement with the Massachusetts Institute of Technology (MIT) to make use of the university's moir fringe alignment technology within MII's nano imprint lithography tools, the company said Tuesday (Nov. 30). MII has demonstrated 7-nanometer 3-sigma alignment using the technique on an MII tool and the company plans to use the technology for alignment in lithography applications. Professor Hank Smith from MIT led the effort to develop this technology and will be part of the ongoing development efforts, MII said. "I believe this is a very strong collaborative agreement, coupled with strong research and development efforts, to advance the state of Step and Flash Imprint Lithography," said Norm Schumaker, chief executive officer of MII.

Molecular Imprints was included in both the first and second iterations of Silicon Strategies' 60 Emerging Startups list.