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double-o-nothing
Multi-beam system developers should consider what happened to field-emission ...
resistion
Sokudo is a vendor positioned and trying to keep options/opportunities open. If ...
Sokudo joins CEA-Leti's e-beam litho project
Peter Clarke
9/16/2010 11:04 AM EDT
LONDON – Sokudo Co. Ltd., a coating and track process equipment company, has announced it will join the Imagine research program based at CEA-Leti that is developing maskless lithography for IC manufacturing at 22-nm and beyond.
The three-year project is led by CEA-Leti (Grenoble, France) and is evaluating the use of a multi-beam e-beam machine from Mapper Lithography BV (Delft, The Netherlands). It includes chip manufacturers Taiwan Semiconductor Manufacturing Co. Ltd. and STMicroelectronics. The multiple e-beam-lithography program covers tool assessment, patterning and process integration, data handling, prototyping and cost analysis.
Sokudo (Kyoto, Japan) is a joint venture company owned by Dainippon Screen Mfg. Co. Ltd. and Applied Materials Inc. in 2006.
"E-beam has the potential to be a viable technology for many sub-22-nm lithography process layers in logic/foundry semiconductor manufacturing," said Tadahiro Suhara, president and CEO of Sokudo, in a statement issued by CEA-Leti. "Sokudo is taking a comprehensive approach to being prepared for coat/develop track process readiness in multiple sub-22nm lithography technologies, including immersion ArF lithography extensions, EUV and e-beam lithography.
Related links and articles:
ST joins CEA-Leti e-beam lithography program
Startup offers maskless litho for PCB production
Leti receives Mapper 300-mm e-beam lithography platform
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pixies
9/16/2010 11:59 AM EDT
It is interesting to see e-beam picking up momentum while EUV keeps disappoint the litho community.
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wilber_xbox
9/16/2010 4:21 PM EDT
looks like baby is growing to take on the world! Always a pleasure to read about any growth related article about the multi e-beam concept. Its still time to give a little more push to multi e-beam technology. Any technology, no matter how promising, can not survive and grow without industry helping it. Big players need to chip in both money and confidence to give this alternative to EUV technology a fighting chance. Hope to read more in the near future.
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resistion
9/16/2010 7:23 PM EDT
Sokudo is a vendor positioned and trying to keep options/opportunities open. If it saw the potential, it would do the same for imprint for example. It is already addressing double patterning flows.
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double-o-nothing
9/16/2010 11:11 PM EDT
Multi-beam system developers should consider what happened to field-emission displays. What happens when an emitter fails in the middle of a batch? Swap out and recalibrate?
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