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Entegris, IBM form partnership
Mark Lapedus
2/24/2011 12:25 PM EST
SAN JOSE, Calif. - Entegris Inc. has announced a joint development agreement with IBM to develop and test new filtration techniques for use in advanced semiconductor manufacturing.
The collaboration will focus on generating test data off of a new generation of Entegris filters and dispense systems that are used to dispense and filter imaging materials as part of the photolithography process in a semiconductor fab.
Entegris will work with IBM's technology team in East Fishkill, N.Y. to develop new technologies for controlling impurities such as particles and bubbles that can negatively impact manufacturing yields.
The collaboration will focus on generating test data off of a new generation of Entegris filters and dispense systems that are used to dispense and filter imaging materials as part of the photolithography process in a semiconductor fab.
Entegris will work with IBM's technology team in East Fishkill, N.Y. to develop new technologies for controlling impurities such as particles and bubbles that can negatively impact manufacturing yields.
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