SPIE: EUV sources behind schedule
2/28/2011 6:36 PM EST
Wanted: More EUV power
EUV tools need some 200 Watts of power to process 100 to 150 wafers an hour. At present, the current EUV tool from ASML is only running at about 10 Watts, said Shang-Yi Chiang, senior vice president of R&D at Taiwan Semiconductor Manufacturing Co. Ltd.
''We are still short by a factor of 20,’’ he warned during a separate keynote. Besides the power source, there is another concern. Lithography costs are ''the biggest challenge’’ to extend Moore’s Law, he said.
TSMC is working on several lithography technologies to extend Moore’s Law. The company is expected to receive a 3100 EUV tool from ASML in the next few months. It also working on maskless lithography and is processing wafers with a tool from Mapper Lithography.
For some time, Cymer has been developing an EUV light source, based on laser produced plasma (LPP) technology. The company has shipped four systems, including one to Samsung, but even Cymer acknowledged that its power source has not met its stated targets.
Cymer, Gigaphoton and others are devising EUV light sources. ''From the light source perspective, we do expect to see white papers from Gigaphoton and Ushio (at SPIE), but continue to view Cymer as continuing to be in the pole position here,’’ said Barclay’s Muse.
Japan's Gigaphoton Inc. announced that the company has demonstrated the highest conversion efficiency (CE) in producing EUV light from tin plasma – a major milestone leading to a highly efficient and cost effective source.
The company also stated its new EUV factory came online a year ago. Gigaphoton’s first commercial system has been built, is in integration testing and will ship later this year.
The demonstrated CE is 3.3 percent, marking the highest figure ever reported on small tin droplets. The droplets are less than 20 ìm (micrometers) in diameter. This advanced performance is a direct result of the company’s design concept to use a short-wavelength laser “pre-pulse” before the main laser irradiates the target droplet.
“The success of this combination of technologies validates Gigaphoton’s expertise in developing solutions that overcome critical industry obstacles to further ensure the adoption of EUV lithography,” said Yuji Watanabe, president of Gigaphoton, in a statement. “The company is poised to tackle the EUV market head-on. To this end, we continue to aggressively invest in our infrastructure, while simultaneously ramping operations within our state-of-the-art factory for EUV light source production. As a result, Gigaphoton is strategically positioned to take advantage of the myriad opportunities provided by EUV lithography.”