Synopsys' StarRC certified for UMC's 28-nm processes
4/3/2012 6:32 PM EDT
SAN FRANCISCO—EDA and IP vendor Synopsys Inc. said Tuesday (April 3) that its StarRC parasitic extraction tool has been certified by Taiwanese foundry United Microelectronics Corp. (UMC) for UMC's 28-nanometer (nm) process technologies.
Synopsys (Mountain View, Calif.) said the StarRC solution delivered silicon-validated accuracy on UMC's evaluation designs to meet the qualification criteria for its advanced 28-nm poly SiON and high K/metal gate processes. The StarRC technology files are immediately available to UMC customers working with its 28-nm processes, Synopsys said.
"The qualification of Synopsys' proven StarRC parasitic extraction solution for UMC's 28-nanometer process technology strengthens the portfolio of resources available to our customers for 28-nanometer designs," said S. C. Chien, vice president of the customer engineering and IP development design support divisions at UMC, in a statement. "Mutual customers can now take full advantage of our latest foundry processes and successfully bring their innovations to the marketplace."
StarRC, a parasitic extraction solution for system-on-chip, custom digital, analog/mixed-signal and memory designs, is a component of Synopsys' Galaxy Implementation Platform. StarRC's 28-nm features include modeling for key parasitic effects, including advanced retargeting effects, new via etch and coupling effects, area-dependent via resistance and capacitance, polynomial-based diffusion resistance, and enhanced layout-dependent device parasitic extraction, according to Synopsys.