Cymer appoints veteran to boost EUV

LONDON – Lithography light source provider Cymer Inc. (San Diego, Calif.) has appointed Klaus Schuegraf as group vice president of extreme ultra violet (EUV) product development.

It was announced that Cymer would be acquired by equipment vendor ASML Lithography NV (Veldhoven, The Netherlands) in October 2012 for about $2.6 billion. The deal was seen as intended to speed up progress in the delivery of EUV lithography scanners with acceptable wafer throughputs, for which brighter and reliable light sources are still required.

Schuegraf will oversee Cymer's EUV engineering and development programs, Cymer said.

"Klaus's deep industry experience and proven product development track record add significantly to the strength of our EUV management team, especially important as we transition from 3100 pilot sources to the first 3300 production sources," said Bob Akins, founder and CEO at Cymer, referencing ASML preproduction and production machine numbers.

Prior to joining Cymer, Schuegraf was corporate vice president and CTO for the Silicon Systems Group of Applied Materials responsible for overseeing the semiconductor products technology roadmap. Prior to Applied Materials, Schuegraf was vice president of technology at SanDisk Corporation where he defined and executed the company's non-volatile NAND flash and 3D memory roadmap. Before that, he held key product and technology development positions at Cypress Semiconductor, Conexant and Micron Technology.   


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