Design Con 2015
Breaking News
Newest First | Oldest First | Threaded View
User Rank
re: Point/Counterpoint: What's the right path for litho?
resistion   2/1/2013 5:43:01 PM
EUV became popular around 1996 as part of the NGL frenzy. People sort of realized there was no good lithography wavelength after 193 nm. Intel was quite familiar with the known choices (like hard X-ray, e-beam, etc.), but knew far less about the extreme ultraviolet range below 100 nm. Those days, people only expected NA to go to 1 (immersion not yet considered) and k1 was not yet considered a knob to be tricked with yet, so wavelength was considered the only scaling knob. The trouble was a wavelength still had to be selected. It was a drastic leap into the unknown. 13.4-13.5 nm was chosen for most convenient optics available at the time (Mo/Si multilayers). Other properties not known. Unfortunately, today we know that it's hard to get a lot of EUV power, and resists don't respond ideally either. Defects can be buried in the multilayers. The industry is supposed to have learned its lesson.

User Rank
re: Point/Counterpoint: What's the right path for litho?
double-o-nothing   9/12/2010 2:54:34 AM
It doesn't make sense to develop a new wavelength over several nodes and then use it over half as many. Moreover, EUV light source consumable is a big waste of tin. Studying the resolution with electrons would have made more sense.

User Rank
re: Point/Counterpoint: What's the right path for litho?
resistion   3/24/2010 6:03:39 AM
EUV represented a knowledge gap which all the companies funded to fill. Optimists always bet on the newest unknown, and the probabiliy is always going to be 50/50 at first. However, as requirements tighten over the years, the odds are not in the favor of the original rosy expectations. Now that EUV's nature has been made more clear, it doesn't look any better than X-ray or e-beam.

User Rank
re: Point/Counterpoint: What's the right path for litho?
Diogenes53   3/23/2010 2:06:58 AM
The more things change, the more things stay the same. X-ray was supposed to replace optical in 1985. It is supposed to replace optical now in 2015, under its new pseudonym, EUV. E-beam direct write was going to replace masks in 1985, at the very least, for low volume. It still is, under its new pseudonym, multi-beam maskless. Perhaps if 8-track stereo, VHS, and DEC changed their names, they'd still be around too. The only new and novel technology is nanoimprint, which is more optical than any of its challengers: it uses an I-line source, I-line resist, and 6"X0.25" optical photomasks. It also happens to have the lowest cost of ownership of any of them, including, easily, double patterning. The only thing it hasn't yet done is change its name: it remains nanoimprint and its a lot better bet than either of its re-named competitors. P.S. EUV is still X-ray, and multibeam maskless is still e-beam direct write. Mother Nature is funny that way.

Top Comments of the Week
Flash Poll
Like Us on Facebook Parts Search

185 million searchable parts
(please enter a part number or hit search to begin)
EE Life
Frankenstein's Fix, Teardowns, Sideshows, Design Contests, Reader Content & More
<b><a href=Betajet">

The Circle – The Future's Imperfect in the Present Tense
The Circle, a satirical, dystopian novel published in 2013 by San Francisco-based writer Dave Eggers, is about a large, very powerful technology company that combines aspects of Google, ...

Max Maxfield

Recommended Reads From the Engineer's Bookshelf
Max Maxfield
I'm not sure if I read more than most folks or not, but I do I know that I spend quite a lot of time reading. I hate to be idle, so I always have a book or two somewhere about my person -- ...

Martin Rowe

Make This Engineering Museum a Reality
Martin Rowe
Post a comment
Vincent Valentine is a man on a mission. He wants to make the first house to ever have a telephone into a telephone museum. Without help, it may not happen.

Rich Quinnell

Making the Grade in Industrial Design
Rich Quinnell
As every developer knows, there are the paper specifications for a product design, and then there are the real requirements. The paper specs are dry, bland, and rigidly numeric, making ...

Special Video Section
The LT8640 is a 42V, 5A synchronous step-down regulator ...
The LTC2000 high-speed DAC has low noise and excellent ...
How do you protect the load and ensure output continues to ...
General-purpose DACs have applications in instrumentation, ...
Linear Technology demonstrates its latest measurement ...
Demos from Maxim Integrated at Electronica 2014 show ...
Bosch CEO Stefan Finkbeiner shows off latest combo and ...
STMicroelectronics demoed this simple gesture control ...
Keysight shows you what signals lurk in real-time at 510MHz ...
TE Connectivity's clear-plastic, full-size model car shows ...
Why culture makes Linear Tech a winner.
Recently formed Architects of Modern Power consortium ...
Specially modified Corvette C7 Stingray responds to ex Indy ...
Avago’s ACPL-K30T is the first solid-state driver qualified ...
NXP launches its line of multi-gate, multifunction, ...
Doug Bailey, VP of marketing at Power Integrations, gives a ...
See how to ease software bring-up with DesignWare IP ...
DesignWare IP Prototyping Kits enable fast software ...
This video explores the LT3086, a new member of our LDO+ ...
In today’s modern electronic systems, the need for power ...