I would need to read this article to know more about the technology. But i guess the article compares the speed with single e-beam lithography. Also the e-beam litho resolution is not limited to 30 or so nm...it can easily reach a single digit resolution.
Does 15nm resolution in this technique is the limit?
Good question; my initial reaction is that the mountain-type terrain is really just for show :); as I understand it the burnt-off material is made up of small molecules, which are so unstable that they become gaseous and are essentially lost to the system. That said, I don't think redeposition was considered in the paper, so it might be something that needs to be considered before commercial applications are possible.
P.S. We had some technical problems with the DOI link over the weekend; it should be working properly now, if you had problems.
If anyone would like to know more about the science behind this story, we've set the original research article free to access for the next few weeks; you can find it here: http://www.materialsviews.com/details/news/687441/Nanocartography__in_3D.html
As we unveil EE Times’ 2015 Silicon 60 list, journalist & Silicon 60 researcher Peter Clarke hosts a conversation on startups in the electronics industry. Panelists Dan Armbrust (investment firm Silicon Catalyst), Andrew Kau (venture capital firm Walden International), and Stan Boland (successful serial entrepreneur, former CEO of Neul, Icera) join in the live debate.