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re: IBM demos faster, cheaper alternative to e-beam litho
EricHuang   6/2/2010 9:35:03 AM
when we can expect such e-bem lith technique can be used for the semiconductor manuacturing?

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re: IBM demos faster, cheaper alternative to e-beam litho
wilber_xbox   4/26/2010 6:13:32 PM
I would need to read this article to know more about the technology. But i guess the article compares the speed with single e-beam lithography. Also the e-beam litho resolution is not limited to 30 or so nm...it can easily reach a single digit resolution. Does 15nm resolution in this technique is the limit?

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re: IBM demos faster, cheaper alternative to e-beam litho
AdrianMiller   4/26/2010 2:38:46 PM
Hi old-timer, Good question; my initial reaction is that the mountain-type terrain is really just for show :); as I understand it the burnt-off material is made up of small molecules, which are so unstable that they become gaseous and are essentially lost to the system. That said, I don't think redeposition was considered in the paper, so it might be something that needs to be considered before commercial applications are possible. Adrian P.S. We had some technical problems with the DOI link over the weekend; it should be working properly now, if you had problems.

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re: IBM demos faster, cheaper alternative to e-beam litho
AdrianMiller   4/23/2010 2:38:51 PM
If anyone would like to know more about the science behind this story, we've set the original research article free to access for the next few weeks; you can find it here: http://www.materialsviews.com/details/news/687441/Nanocartography__in_3D.html Adrian Miller Advanced Materials

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