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resistion
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re: Sematech and Zeiss tool to measure EUV mask defects
resistion   9/7/2010 2:40:42 PM
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This work is really started very late, I think it leaves only two nodes effectively for EUV application, before the wavelength has to be changed again. That hardly justifies the cost of ownership. The investment and development time far exceed the usage time (5-6 years).

double-o-nothing
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re: Sematech and Zeiss tool to measure EUV mask defects
double-o-nothing   7/21/2010 9:10:32 AM
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I think I get it. EUV is just the poster child for NGL - something that will never happen but really great to look forward to a few years away - every year. It needs to have just the right combination of benefits and difficulties.

pixies
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re: Sematech and Zeiss tool to measure EUV mask defects
pixies   7/10/2010 7:47:37 PM
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Why did it take the industry so long to start working on the inspection tool since it is such an important part of the manufacturing process. EUV was originally slated for volume production in 2009. Looking back, the fact that the industry has just started developing the inspection tool in 2010 reflect the total lack of confidence in this technology.



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As data rates begin to move beyond 25 Gbps channels, new problems arise. Getting to 50 Gbps channels might not be possible with the traditional NRZ (2-level) signaling. PAM4 lets data rates double with only a small increase in channel bandwidth by sending two bits per symbol. But, it brings new measurement and analysis problems. Signal integrity sage Ransom Stephens will explain how PAM4 differs from NRZ and what to expect in design, measurement, and signal analysis.

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