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resistion
User Rank
CEO
re: Sematech and Zeiss tool to measure EUV mask defects
resistion   9/7/2010 2:40:42 PM
NO RATINGS
This work is really started very late, I think it leaves only two nodes effectively for EUV application, before the wavelength has to be changed again. That hardly justifies the cost of ownership. The investment and development time far exceed the usage time (5-6 years).

double-o-nothing
User Rank
Rookie
re: Sematech and Zeiss tool to measure EUV mask defects
double-o-nothing   7/21/2010 9:10:32 AM
NO RATINGS
I think I get it. EUV is just the poster child for NGL - something that will never happen but really great to look forward to a few years away - every year. It needs to have just the right combination of benefits and difficulties.

pixies
User Rank
Rookie
re: Sematech and Zeiss tool to measure EUV mask defects
pixies   7/10/2010 7:47:37 PM
NO RATINGS
Why did it take the industry so long to start working on the inspection tool since it is such an important part of the manufacturing process. EUV was originally slated for volume production in 2009. Looking back, the fact that the industry has just started developing the inspection tool in 2010 reflect the total lack of confidence in this technology.



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