Breaking News
Comments
Newest First | Oldest First | Threaded View
<<   <   Page 2 / 2
me3
User Rank
Author
re: Lithography roadmap offers questions and openings
me3   7/16/2010 7:08:51 PM
NO RATINGS
While Intel marches on and on and on with a few fully depreciated steppers ..... Why the genius at GF doesn't notice? And they just separated design from manufacturing.

jokosa
User Rank
Author
re: Lithography roadmap offers questions and openings
jokosa   7/16/2010 6:46:40 PM
NO RATINGS
Whatever happened to interferometry nodes? I have not heard of them for 10 years, but coupled with todays spacial patterning it seems like an idea ready for more research...

resistion
User Rank
Author
re: Lithography roadmap offers questions and openings
resistion   7/16/2010 4:38:04 PM
NO RATINGS
The replication part is great but beam conditions drift which can cause overlay problems or other defects given enough time. Maybe multibeam + imprint is the answer?

walken1
User Rank
Author
re: Lithography roadmap offers questions and openings
walken1   7/16/2010 3:21:30 PM
NO RATINGS
If memory serves me correctly, the master imprint mask is written with an e-beam writer, but the replica masks are produced using the same nanoimprint process used for IC production -- the master mask imprints the replica masks. So e-beam write times shouldn't be a major factor.

unknown multiplier
User Rank
Author
re: Lithography roadmap offers questions and openings
unknown multiplier   7/16/2010 12:05:55 PM
NO RATINGS
I'd imagine if EUV tools were available in 2011-2012, some companies would still be able to skip immersion and double patterning entirely, catching up to those who bought EUV, and immersion, and double patterning. The dragging out of 193 nm technology has enabled leaders to keep their lead.

resistion
User Rank
Author
re: Lithography roadmap offers questions and openings
resistion   7/16/2010 7:42:40 AM
NO RATINGS
Mind the ebeam write time for those imprint masks!

<<   <   Page 2 / 2


Datasheets.com Parts Search

185 million searchable parts
(please enter a part number or hit search to begin)
Radio
LATEST ARCHIVED BROADCAST

What are the engineering and design challenges in creating successful IoT devices? These devices are usually small, resource-constrained electronics designed to sense, collect, send, and/or interpret data. Some of the devices need to be smart enough to act upon data in real time, 24/7. Specifically the guests will discuss sensors, security, and lessons from IoT deployments.

Brought to you by:

Like Us on Facebook
Special Video Section
In this short video we show an LED light demo to ...
02:46
Wireless Power enables applications where it is difficult ...
07:41
LEDs are being used in current luxury model automotive ...
With design sizes expected to increase by 5X through 2020, ...
01:48
Linear Technology’s LT8330 and LT8331, two Low Quiescent ...
The quality and reliability of Mill-Max's two-piece ...
LED lighting is an important feature in today’s and future ...
05:27
The LT8602 has two high voltage buck regulators with an ...
05:18
Silego Technology’s highly versatile Mixed-signal GreenPAK ...
The quality and reliability of Mill-Max's two-piece ...
01:34
Why the multicopter? It has every thing in it. 58 of ...
Security is important in all parts of the IoT chain, ...
Infineon explains their philosophy and why the multicopter ...
The LTC4282 Hot SwapTM controller allows a board to be ...
This video highlights the Zynq® UltraScale+™ MPSoC, and sho...
Homeowners may soon be able to store the energy generated ...
The LTC®6363 is a low power, low noise, fully differential ...
See the Virtex® UltraScale+™ FPGA with 32.75G backplane ...
Vincent Ching, applications engineer at Avago Technologies, ...
The LT®6375 is a unity-gain difference amplifier which ...