If memory serves me correctly, the master imprint mask is written with an e-beam writer, but the replica masks are produced using the same nanoimprint process used for IC production -- the master mask imprints the replica masks. So e-beam write times shouldn't be a major factor.
I'd imagine if EUV tools were available in 2011-2012, some companies would still be able to skip immersion and double patterning entirely, catching up to those who bought EUV, and immersion, and double patterning. The dragging out of 193 nm technology has enabled leaders to keep their lead.
What are the engineering and design challenges in creating successful IoT devices? These devices are usually small, resource-constrained electronics designed to sense, collect, send, and/or interpret data. Some of the devices need to be smart enough to act upon data in real time, 24/7. Are the design challenges the same as with embedded systems, but with a little developer- and IT-skills added in? What do engineers need to know? Rick Merritt talks with two experts about the tools and best options for designing IoT devices in 2016. Specifically the guests will discuss sensors, security, and lessons from IoT deployments.