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Lithomike
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re: Lithography roadmap offers questions and openings
Lithomike   11/8/2010 4:56:52 PM
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Since it is a 1:1 technology can you really write perfect 22nm and smaller features on the master? Here you don't have the 4:1 leverage.

double-o-nothing
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re: Lithography roadmap offers questions and openings
double-o-nothing   7/19/2010 3:42:25 PM
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The defect yield of EUV or imprint is low enough that the cost overall will still be higher than double patterning. Multiple reworks still a form of multiple patterning.

resistion
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re: Lithography roadmap offers questions and openings
resistion   7/19/2010 4:46:45 AM
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Well, those late followers obviously contributed least to the technology development.

KB3001
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re: Lithography roadmap offers questions and openings
KB3001   7/18/2010 4:59:38 PM
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@resistion, I do not see why is it unfair for late adopters to gain an economic advantage in the scenario you envisage? Being the first adopter does not give anybody a divine right to succeed.

resistion
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re: Lithography roadmap offers questions and openings
resistion   7/18/2010 3:32:58 PM
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I do not dispute the cost efficiency of the replication. But the write time is ~ 2wks for 1 nA beam current and a sq. cm area.

resistion
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re: Lithography roadmap offers questions and openings
resistion   7/18/2010 3:23:11 PM
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In the 2012-3 timeframe, all the 193 nm immersion customers are either using double patterning to get ahead or staying behind with single patterning at 4x nm. If a sudden reduction of litho cost occurred in 2014-5, those who stayed behind and avoided the massive costs of double patterning would benefit more, somewhat unfairly.

Diogenes53
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re: Lithography roadmap offers questions and openings
Diogenes53   7/17/2010 10:48:21 PM
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If EUV tools are available in 2011-2012, they will most likely be beta tools which cost well over $100 million each and run at a few wafers per hour. No company can afford that kind of "leadership".

Diogenes53
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re: Lithography roadmap offers questions and openings
Diogenes53   7/17/2010 10:43:28 PM
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The ebeam write time for imprint masks is virtually irrelevant. The ebeam written masks will be used for masters to make very cheap (~$5K) mask replicas using a specially designed imprint mask replication tool. A master can produce thousands and thousands of replicas, thus amortizing the master cost to virtually zero.

pixies
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re: Lithography roadmap offers questions and openings
pixies   7/17/2010 6:21:10 PM
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even with NA = 1.3, interferometric tools give you ~ 45 nm pitch with 193 nm light. Plus double patterning you get to 22 nm. That's a one generation tool. Let alone the lack of maturity and versatility of the interferometric tools.

goafrit
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re: Lithography roadmap offers questions and openings
goafrit   7/17/2010 4:02:13 PM
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Yes, it is happening in China where all the big firms are pumping research money. They make so much abroad and hate to send back to US to avoid paying taxes. Suddenly they have to spend that money offshore. That is where it is happening

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As data rates begin to move beyond 25 Gbps channels, new problems arise. Getting to 50 Gbps channels might not be possible with the traditional NRZ (2-level) signaling. PAM4 lets data rates double with only a small increase in channel bandwidth by sending two bits per symbol. But, it brings new measurement and analysis problems. Signal integrity sage Ransom Stephens will explain how PAM4 differs from NRZ and what to expect in design, measurement, and signal analysis.

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