Embedded Systems Conference
Breaking News
Comments
Newest First | Oldest First | Threaded View
docdivakar
User Rank
Author
re: Mentor moves tools toward 16-nanometer
docdivakar   9/21/2010 5:56:08 PM
NO RATINGS
The wait is going to be longer for using EUV at 16nm. At Nikon's LithoVision San Jose this year, Nikon made announcements that EUV's availability at 16nm (they missed for 22nm!) is pushed to dates 2012 or later. I like Mr. Sawicki's take on 3D. Sure enough, the most optimum and reliable 3D stacked system is the one that is homogeneous. But this is years away from productization. There needs to be a sea change of capabilities and features implemented in the current 2D (or 2.5D) EDA tools. Circuit simulators need to work side by side with field simulators (emag, thermal & stress) in a practical way (read: shouldn't take several days to simulate!) to make the design process manageable. Heterogeneous stacks on the other hand are seeing a good pace of development. There are several MPW's on the way that help researchers and product developers test their designs. The design challenge here using existing EDA tools is by no means a lesser challenge than the homogeneous stacks. Dr. MP Divakar

resistion
User Rank
Author
re: Mentor moves tools toward 16-nanometer
resistion   8/26/2010 6:43:31 AM
NO RATINGS
Wonder if Mentor implemented multiple patterning at 16 nm.

krisi
User Rank
Author
re: Mentor moves tools toward 16-nanometer
krisi   8/25/2010 2:08:19 PM
NO RATINGS
16nm? Sounds like very early. First is not always better for business in this case...plus how many companies can really do 16nm silicon processing? 3? 5? so any EDA development is really custom for a particular foundry considering large difference between them, at least initially until some equipment standardization happens...Kris

unknown multiplier
User Rank
Author
re: Mentor moves tools toward 16-nanometer
unknown multiplier   8/24/2010 4:12:01 PM
NO RATINGS
Are they going to cross-license with Tela Innovations?

double-o-nothing
User Rank
Author
re: Mentor moves tools toward 16-nanometer
double-o-nothing   8/24/2010 2:45:56 AM
NO RATINGS
Need to spread your net wide below 22 nm. Even 3-D is not a for sure thing. Trend extrapolation has its limit, that limit is about now. Double or even multiple patterning is the most natural choice for now, even if pushing Moore's law more slowly than before.

goafrit
User Rank
Author
re: Mentor moves tools toward 16-nanometer
goafrit   8/24/2010 1:07:01 AM
NO RATINGS
Let me congratulate Mentor Graphics. However, going down may not really be great business. In this race of nanometer devices, not being an early adopter could pay off better.



Top Comments of the Week
Like Us on Facebook

Datasheets.com Parts Search

185 million searchable parts
(please enter a part number or hit search to begin)
EE Life
Frankenstein's Fix, Teardowns, Sideshows, Design Contests, Reader Content & More
Max Maxfield

Awesome 3D Electronic Sculptures
Max Maxfield
8 comments
I recently received an email from someone we'll call Martin (because that's his name). Martin's message was short and sweet. In its entirety it read: "You need to see this!"

Jack Ganssle, Embedded.com

Processor Pinups
Jack Ganssle, Embedded.com
4 comments
My wife and I joke about our “adult” magazines. For her, those are the publications about beading. For me, they’re tool catalogs and Fine Woodworking magazine. The latter ...

Rajaram Regupathy, Cypress Semiconductor

Add USB Battery Charging Protocols to an Android-Based Design
Rajaram Regupathy, Cypress Semiconductor
Post a comment
Editorial Note: Excerpted from Unboxing Android: A hands on approach with real world examples, by Rajaram Regupathy, the author takes you through the process incorporating effective power ...

Rich Quinnell

Making the Grade in Industrial Design
Rich Quinnell
16 comments
As every developer knows, there are the paper specifications for a product design, and then there are the real requirements. The paper specs are dry, bland, and rigidly numeric, making ...

Special Video Section
The LT8640 is a 42V, 5A synchronous step-down regulator ...
The LTC2000 high-speed DAC has low noise and excellent ...
How do you protect the load and ensure output continues to ...
General-purpose DACs have applications in instrumentation, ...
Linear Technology demonstrates its latest measurement ...
10:29
Demos from Maxim Integrated at Electronica 2014 show ...
Bosch CEO Stefan Finkbeiner shows off latest combo and ...
STMicroelectronics demoed this simple gesture control ...
Keysight shows you what signals lurk in real-time at 510MHz ...
TE Connectivity's clear-plastic, full-size model car shows ...
Why culture makes Linear Tech a winner.
Recently formed Architects of Modern Power consortium ...
Specially modified Corvette C7 Stingray responds to ex Indy ...
Avago’s ACPL-K30T is the first solid-state driver qualified ...
NXP launches its line of multi-gate, multifunction, ...
Doug Bailey, VP of marketing at Power Integrations, gives a ...
See how to ease software bring-up with DesignWare IP ...
DesignWare IP Prototyping Kits enable fast software ...
This video explores the LT3086, a new member of our LDO+ ...
In today’s modern electronic systems, the need for power ...
Radio
LATEST ARCHIVED BROADCAST
EE Times Senior Technical Editor Martin Rowe will interview EMC engineer Kenneth Wyatt.
Flash Poll