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double-o-nothing
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re: The horror of 80-hour photomask write times
double-o-nothing   10/3/2010 3:55:26 PM
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Irony is direct write had the earliest forms of multiple-exposure patterning. Still in use today. Now optical has to have it as well.

daleste
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CEO
re: The horror of 80-hour photomask write times
daleste   10/3/2010 2:36:20 PM
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I always wanted the direct write to wafer for prototypes. Seems like such a good idea, it just isn't as easy as you would expect.

wilber_xbox
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CEO
re: The horror of 80-hour photomask write times
wilber_xbox   9/29/2010 10:07:29 PM
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Mapper has updated its concept...The total number of beams in the final mapper system will be 13000*49 (=0.6m) for 22nmHP. And for 10WPH, there will be 10 tools writing simultaneously. You can do the math now!

double-o-nothing
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re: The horror of 80-hour photomask write times
double-o-nothing   9/24/2010 1:09:57 AM
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It might be worse than that. Considering Mapper uses 13000 beams for 10 WPH, that would mean 1300 hr write times for single beam direct write. If higher beam voltages used, it could be much longer.

double-o-nothing
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re: The horror of 80-hour photomask write times
double-o-nothing   9/23/2010 2:29:29 PM
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It's fair to expect 40 nm features on a sub-20 nm mask. That is almost like 45 nm direct write today. It could be more than day's write time.



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