Good to read about some spending from the big companies in my area of work. I can safely assume that there will be lot of new jobs coming from ASML and that's pretty nice for new engineers and professionals like me.
I assume you meant that sarcastically.
None of the money goes to US companies. (apparently once again, we have become total losers in a technology that for the most part, started here.) Plus who nows where this equipment is going: US or China?
Immersion lithography is used because the index of refraction of water is higher than that of air, and that property is used to create finer details on the wafer than is possible by using the same wavelength light in air. KrF refers to the gas used in the exposure lamp to create a monochromatic light source. Any litho guys out there can correct any errors I may have made.
The immersion tools are lithography tools which use 193 nm wavelength and immerse the exposed part of the wafer under water. ASML uses the same drop of water blown over the wafer, while Nikon flows water under the lens and sucks it back up. Only Nikon immersion tools are used for Intel's 32 nm critical layers. They are said to be cheaper possibly because of smaller footprint.
The KrF tools use a longer wavelength (248 nm) and could be used for the looser layers, like the higher Cu damacene layers. Their resolution is not so strong as immersion but it is sufficient plus they offer the better depth of focus.
There is no doubt now that intel will skip 28nm, inspite focusing on smaller size. Besides why to give big share to Nikon who has problems with ultra litho where ASML is in good shape. At this point Nikon's efforts would change the score of the game