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resistion
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re: Intel to spend $1.5 billion on litho
resistion   10/30/2010 4:15:52 PM
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It looks like EUV won't meet Intel's 15 nm timeline, so DP will be necessary and extended to 11 nm. Tool re-use seems most likely.

Jack_1983
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re: Intel to spend $1.5 billion on litho
Jack_1983   10/28/2010 9:44:30 PM
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The light is generated by a laser, not a lamp, but the gas is correct. ArF is used for 193 nm illumination and KrF is used for 248 nm.

wilber_xbox
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re: Intel to spend $1.5 billion on litho
wilber_xbox   10/28/2010 7:24:44 PM
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Good to read about some spending from the big companies in my area of work. I can safely assume that there will be lot of new jobs coming from ASML and that's pretty nice for new engineers and professionals like me.

dutchmam
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re: Intel to spend $1.5 billion on litho
dutchmam   10/28/2010 7:02:01 PM
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I assume you meant that sarcastically. None of the money goes to US companies. (apparently once again, we have become total losers in a technology that for the most part, started here.) Plus who nows where this equipment is going: US or China?

Kaiser Silicon
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re: Intel to spend $1.5 billion on litho
Kaiser Silicon   10/28/2010 2:44:24 PM
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Immersion lithography is used because the index of refraction of water is higher than that of air, and that property is used to create finer details on the wafer than is possible by using the same wavelength light in air. KrF refers to the gas used in the exposure lamp to create a monochromatic light source. Any litho guys out there can correct any errors I may have made.

double-o-nothing
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re: Intel to spend $1.5 billion on litho
double-o-nothing   10/28/2010 1:10:41 PM
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The immersion tools are lithography tools which use 193 nm wavelength and immerse the exposed part of the wafer under water. ASML uses the same drop of water blown over the wafer, while Nikon flows water under the lens and sucks it back up. Only Nikon immersion tools are used for Intel's 32 nm critical layers. They are said to be cheaper possibly because of smaller footprint. The KrF tools use a longer wavelength (248 nm) and could be used for the looser layers, like the higher Cu damacene layers. Their resolution is not so strong as immersion but it is sufficient plus they offer the better depth of focus.

yalanand
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re: Intel to spend $1.5 billion on litho
yalanand   10/28/2010 9:06:34 AM
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What does 27 immersion tools and 15 KrF tools refer to ? Any process expert in this forum please answer.

double-o-nothing
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re: Intel to spend $1.5 billion on litho
double-o-nothing   10/28/2010 3:44:52 AM
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Nikon has longer standing account with Intel. Plus they have more experience with 32 nm.

goafrit
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re: Intel to spend $1.5 billion on litho
goafrit   10/28/2010 1:18:15 AM
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I am happy for Intel because they are spending in America.

Baolt
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re: Intel to spend $1.5 billion on litho
Baolt   10/28/2010 12:37:02 AM
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There is no doubt now that intel will skip 28nm, inspite focusing on smaller size. Besides why to give big share to Nikon who has problems with ultra litho where ASML is in good shape. At this point Nikon's efforts would change the score of the game



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