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any1
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re: Is fab tool business model broken?
any1   1/27/2011 10:24:06 PM
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One of the major reasons that nanoimprint and maskless lithography are behind EUV is that early in the development of next generation lithography tools Intel and a few other large companies made sure that most of the resources were funneled to EUV. Nanoimprint and maskless technologies were ignored and starved. Over the last several years there has been so much money and effort thrown at EUV tool and process development that it has become "too big to fail".

mark.lapedus
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re: Is fab tool business model broken?
mark.lapedus   1/24/2011 7:59:11 PM
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Any more comments Bruzzer? I am interested

KB3001
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re: Is fab tool business model broken?
KB3001   1/22/2011 12:25:21 AM
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Quite right. It's happening in a way already, but harsh economics will accelerate the trend.

sdb
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re: Is fab tool business model broken?
sdb   1/22/2011 12:05:30 AM
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Bruzzer - it is a tale told by an idiot, full of sound and fury, signifying nothing." Macbeth (Act V, Scene V).

mark.lapedus
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re: Is fab tool business model broken?
mark.lapedus   1/20/2011 4:43:11 PM
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Hi. I talked to DNP this week. They say the MII is an R&D system. I will follow up. thanks

scummings55
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re: Is fab tool business model broken?
scummings55   1/20/2011 4:20:35 PM
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Earlier this month DNP announced the purchase of a semiconductor 6025 mask replication tool from Molecular Imprints that uses nanoimprint lithography, making good on the article you wrote in July 2009 (http://www.eetimes.com/electronics-news/4083666/DNP-MII-devise-nano-imprint-mask-technology). They say NIL is progressing to pilot production for semi. Why not follow up and get the latest news from these folks?

atifh1
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re: Is fab tool business model broken?
atifh1   1/20/2011 5:08:29 AM
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intel bashing in gibberish?

mark.lapedus
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re: Is fab tool business model broken?
mark.lapedus   1/20/2011 1:51:03 AM
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Nano-imprint and maskless are behind EUV. We have covered these topics extensively. Nano-imprint is not ready for prime time in semis. Not sure it will ever work for semis. Maskless or ML2 is still science fiction.

scummings55
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re: Is fab tool business model broken?
scummings55   1/19/2011 11:09:23 PM
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Given the challenges, uncertainty and expense still to come for EUV, I do not understand why other next-gen technologies are not mentioned in such a discussion. What is the status of nanoimprint lithography and maskless writing? Simple economics says $125M/tool is not a plausible solution.

resistion
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re: Is fab tool business model broken?
resistion   1/19/2011 2:19:06 PM
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If they had one bad generation of tools just at the time it was most needed, that is enough to set them back, as the next time, customers would have some doubts. I suspect this happened with their last dry ArF tool. So they couldn't recover enough business in the immersion stage.

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