One of the major reasons that nanoimprint and maskless lithography are behind EUV is that early in the development of next generation lithography tools Intel and a few other large companies made sure that most of the resources were funneled to EUV. Nanoimprint and maskless technologies were ignored and starved. Over the last several years there has been so much money and effort thrown at EUV tool and process development that it has become "too big to fail".
Earlier this month DNP announced the purchase of a semiconductor 6025 mask replication tool from Molecular Imprints that uses nanoimprint lithography, making good on the article you wrote in July 2009 (http://www.eetimes.com/electronics-news/4083666/DNP-MII-devise-nano-imprint-mask-technology). They say NIL is progressing to pilot production for semi. Why not follow up and get the latest news from these folks?
Intel is responsible for fabrication equipment industry consolidation to maintain their own process, fabrication, microprocessor and intra platform computing monopolies. In an environment where Intel has destroyed competitors and concentrated their own dealing cartel by racing process destructively. That is at a pace in excess of product organic market efficiencies for nearly two decades. Honest, Intel has never supported the expansion of subordinate economic potentials other than their own. When Moore’s law is an axiom misrepresented to conceal Rock’s enterprise monopoly objective. Where Intel plans in advance the concentration of compliment’s into their Dark hole. In an environment where Intel leads too productize subsequent process regimes, only to move so rapidly to the next, that the prior is prevented organic commercialization. Promoting the very inefficiencies that limit economic profit due fabrication equipment and material design manufacturer’s for reinvestment into a sustainable development practice. Really, today, why doesn’t an Intel microscope kit for young adults come equipped with a barrel etcher and 20 2 inch wafers to fabricate a radio, media player and memory stick? That answer is fabrication process regime never freed from Intel monopoly restraints. And now, at 450 millimeter, under Intel control invites the catalyst for a destructive accelerant. By an executive team that cannot demonstrate management antitrust compliance to free industry from the many form of Intel industrial slave society. Where everyone knows Intel’s objective is to bar others from crossing a very narrow bridge into the new world of molecular electronics. Mike Bruzzone, Camp Marketing Consultancy.
Nano-imprint and maskless are behind EUV. We have covered these topics extensively. Nano-imprint is not ready for prime time in semis. Not sure it will ever work for semis. Maskless or ML2 is still science fiction.
Given the challenges, uncertainty and expense still to come for EUV, I do not understand why other next-gen technologies are not mentioned in such a discussion. What is the status of nanoimprint lithography and maskless writing?
Simple economics says $125M/tool is not a plausible solution.
What are the engineering and design challenges in creating successful IoT devices? These devices are usually small, resource-constrained electronics designed to sense, collect, send, and/or interpret data. Some of the devices need to be smart enough to act upon data in real time, 24/7. Are the design challenges the same as with embedded systems, but with a little developer- and IT-skills added in? What do engineers need to know? Rick Merritt talks with two experts about the tools and best options for designing IoT devices in 2016. Specifically the guests will discuss sensors, security, and lessons from IoT deployments.