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resistion
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re: EUV litho era begins, but is it ready?
resistion   2/2/2011 6:50:10 AM
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Can't claim EUV litho era has started, when no infrastructure exists. 2015 doesn't look feasible anymore. Device damage also hasn't been covered yet.

double-o-nothing
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re: EUV litho era begins, but is it ready?
double-o-nothing   2/2/2011 7:19:47 AM
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So if I understand it right, the tpt of the preproduction 3100 is 10-12 wph instead of 60, well short of spec.

resistion
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re: EUV litho era begins, but is it ready?
resistion   2/2/2011 9:17:42 AM
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I knew something else read funny. Didn't TSMC get first NXE:3100 before Samsung?

EUV OR BUST
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re: EUV litho era begins, but is it ready?
EUV OR BUST   2/2/2011 9:44:03 AM
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@t resistion. Samsung is the first customer of the NXE:3100

resistion
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re: EUV litho era begins, but is it ready?
resistion   2/2/2011 1:42:01 PM
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Ok, then this would be an important data point. Checking the old news, TSMC declared their interest in early 2010 but did not plan to get it in 2010.

EUV OR BUST
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re: EUV litho era begins, but is it ready?
EUV OR BUST   2/2/2011 2:14:30 PM
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Almost all customers shared interest in euv in 2010: Delivery of the NXE:3100 is another story and only some people at asml knows when delivery of the next system will start. All customers want their tools as early as possible

mark.lapedus
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re: EUV litho era begins, but is it ready?
mark.lapedus   2/2/2011 5:01:32 PM
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Is industry in trouble, given EUV is late to the party?

double-o-nothing
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re: EUV litho era begins, but is it ready?
double-o-nothing   2/4/2011 2:32:30 AM
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Since memory structures are approaching 4F^2 shape factor, this can be accommodated by crossed line patterning with spacers. For logic, the use of incrementally increasing exposures is already the default plan. So the industry will go on as usual. Introducing EUV at 22 nm is already much harder than the original plan to introduce at 100 nm. But it's already too late for 22, and even 15 nm.

SiFarmer (Ret.)
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re: EUV litho era begins, but is it ready?
SiFarmer (Ret.)   2/2/2011 6:19:40 PM
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A bit more details please. What's the NXE:3100's laser source and lens material?

SiFarmer (Ret.)
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re: EUV litho era begins, but is it ready?
SiFarmer (Ret.)   2/2/2011 9:09:14 PM
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'scuse the dumb questions. Answers: plasma source: drops of molten tin+CO2 laser (Wikipedia); no lenses -- mirrors+vaccuum.

EUV OR BUST
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re: EUV litho era begins, but is it ready?
EUV OR BUST   2/2/2011 7:49:33 PM
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Industry is not in trouble, given the fact EUV is a little bit later than planed. I think economic situation is a bigger problem for the future, when it's down there are only a few company's that wil invest in R&D.

EUV OR BUST
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re: EUV litho era begins, but is it ready?
EUV OR BUST   2/2/2011 7:55:51 PM
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http://www.asml.com/doclib/press/asml_20101006_SEMICON_West_2010_ASML_EUVL_final_handout.pdf

SiFarmer (Ret.)
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re: EUV litho era begins, but is it ready?
SiFarmer (Ret.)   2/2/2011 9:09:57 PM
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Thanks.

resistion
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re: EUV litho era begins, but is it ready?
resistion   2/3/2011 12:20:18 AM
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The existing litho technology can be iterated indefinitely as needed. So the motivation for alternatives is only cost, which is tricky.

Vladislav_L
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re: EUV litho era begins, but is it ready?
Vladislav_L   2/5/2011 12:13:47 AM
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First. I see, that the future of EUV is adequate beyond 10-14nm resolution. Indeed, if we use short, one-pulse laser many-beams lithography tool plus nonlinear sofisticated resists as a part on wafer image formation process we will have this. Second. We will use non-traditional logic before charge transmission, Imean tha the wawe function will going between some logic elements based on QD. The nuts of this I see that we can use one step lithography on layer of metallization. Otherwords, we can make fully flat logic. The idea this logic based on researrchers form France, but realisation, as I suppose, fully new.

unknown multiplier
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re: EUV litho era begins, but is it ready?
unknown multiplier   2/5/2011 3:04:40 AM
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As mentioned earlier, EUV was originally intended for 100 nm and now can only be targeted for 10 nm or less. This is an order of magnitude or more tighter requirements. But the tools did not improve an order of magnitude. At the same time, the 193 nm wavelength was able to cover this entire range. So the relevance of wavelength selection is disappearing quickly.

resistion
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re: EUV litho era begins, but is it ready?
resistion   2/5/2011 3:50:40 AM
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Indeed, the unpolarized 13.5 nm wavelength is not sufficient for 10 nm half-pitch.

yalanand
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re: EUV litho era begins, but is it ready?
yalanand   2/6/2011 3:21:41 AM
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@Mark, When you say "these machines will have been shipped to customers by mid-2011" you mean production worth tool or tool will be sent to R&D site ? If its R&D then I think there is still long way to go before EUV era begins.

Hephaestus
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re: EUV litho era begins, but is it ready?
Hephaestus   2/8/2011 4:34:32 PM
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Technical solutions exist now for defect-free masks. The litho industry is just slow (as usual) in recognizing this fact.

resistion
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CEO
re: EUV litho era begins, but is it ready?
resistion   2/8/2011 5:16:27 PM
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Inspection-free doesn't count as defect-free!



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