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R_Colin_Johnson
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re: Multi-photon photoresists said to beat UV
R_Colin_Johnson   2/9/2011 5:09:18 PM
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Yes, its two photon absorbtion alright. Check out the video I reference below.

R_Colin_Johnson
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Blogger
re: Multi-photon photoresists said to beat UV
R_Colin_Johnson   2/9/2011 5:00:54 PM
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Most of your questions can be answered by viewing a video prepared by professor John Fourkas and his students at: http://pubs.acs.org/page/jpclcd/fourkas-video.html

motti2
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re: Multi-photon photoresists said to beat UV
motti2   2/9/2011 4:41:58 PM
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from the sound of it, this will not necessarily be capable of FINE Lines and Gaps simultaneously. It sounds like the proposed dual photon will enable patterning subwavelength lines, unclear if the spacing will benefit comparably ( hence the long announced commercialization delay - possibly ). In some low density applications, where speed of sparse transistors is paramount, this if a proper exposure machine is developed, might make say ungodly fast RF devices or low density logic possible and ?practical for production .... The only critical aspect not discussed is line edge roughness - its process margin and its impact on useful minimum line feature size. I somehow have some skepticism re potential for minimum gaps scaling comparably with minum lines ( ie needed for VLSI designs ) per the brief description given ( ie contact holes and line spacing ). None the less interesting advance.

resistion
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CEO
re: Multi-photon photoresists said to beat UV
resistion   2/9/2011 12:37:27 AM
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So these photoresists will be sensitive to the proverbial cleanroom yellow light?

krisi
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CEO
re: Multi-photon photoresists said to beat UV
krisi   2/9/2011 12:13:34 AM
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Interesting concept...but can someone explain how this really works? My PhD in solid-state is not sufficient here ;-)...dr Kris

treebrd
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re: Multi-photon photoresists said to beat UV
treebrd   2/8/2011 11:50:35 PM
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Is this true two photon absorbtion as in the quantum mechanical effect?

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