There is a company called LumArray out of MIT has been trying to apply similar type of technology to their maskless litho systems for almost 10 years. And is selling working systems now. Prof. Fourkas' approach requires two high a light intensity it will be difficult to achieve high throughput. In addition, a similar SEM picture has been posted outside Prof. Fourkas' lab at UMD for about 10 years, how come it has just mad news?
OK, it turns out that the yellow cleanroom light will not expose this special photoresist. Here is what professor Fourkas says: "We do everything under yellow cleanroom lights, so it's not highly sensitive to it. We tend to prepare resists fresh and use them within a day or so, and so it's possible that there could be a longer-term effect if they aren't stored in the dark (like any other photoresist....)"